@misc{BertaudSowinskaWalczyketal., author = {Bertaud, Thomas and Sowinska, Małgorzata and Walczyk, Damian and Thiess, Sebastian and Walczyk, Christian and Gloskovski, A. and Drube, W. and Schroeder, Thomas}, title = {In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by Hard X-ray Photoelectron Spectroscopy}, series = {Applied Physics Letters}, volume = {112}, journal = {Applied Physics Letters}, number = {4}, pages = {043506 -- 043511}, language = {en} } @misc{BertaudWalczykSowinskaetal., author = {Bertaud, Thomas and Walczyk, Damian and Sowinska, Małgorzata and Wolansky, Dirk and Tillack, Bernd and Schoof, Gunther and Korolevych, R. and Wenger, Christian and Thiess, Sebastian and Schroeder, Thomas and Walczyk, Christian}, title = {HfO2-based RRAM for Embedded Nonvolatile Memory: From Materials Science to Integrated 1T1R RRAM Arrays}, series = {ECS transactions}, volume = {50}, journal = {ECS transactions}, number = {4}, issn = {1938-6737}, pages = {21 -- 26}, language = {en} } @misc{SowinskaBertaudWalczyketal., author = {Sowinska, Małgorzata and Bertaud, Thomas and Walczyk, Damian and Thiess, Sebastian and Schubert, Markus Andreas and Lukosius, Mindaugas and Drube, W. and Walczyk, Christian and Schr{\"o}der, Thomas}, title = {Hard X-ray Photoelectron Spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures}, series = {Applied Physics Letters}, volume = {100}, journal = {Applied Physics Letters}, number = {23}, issn = {0003-6951}, pages = {233509 -- 233514}, language = {en} } @misc{DabrowskiLippertAvilaetal., author = {Dabrowski, Jarek Marek and Lippert, Gunther and Avila, J. and Baringhaus, Jens and Colambo, I. and Dedkov, Yu. S. and Herziger, Felix and Lupina, Grzegorz and Maultzsch, J. and Schaffus, T. and Schr{\"o}der, Thomas and Sowinska, Małgorzata and Tegenkamp, Christoph and Vignaud, D. and Asensio, Maria Carmen}, title = {Understanding the growth mechanism of graphene on Ge/Si(001) surfaces}, series = {Scientific Reports}, journal = {Scientific Reports}, number = {6}, issn = {2045-2322}, doi = {10.1038/srep31639}, pages = {Art. 31639}, language = {en} } @misc{SowińskaHenkelSchmeisseretal., author = {Sowińska, Małgorzata and Henkel, Karsten and Schmeißer, Dieter and K{\"a}rkk{\"a}nen, Irina and Schneidewind, Jessica and Naumann, Franziska and Gruska, Bernd and Gargouri, Hassan}, title = {Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study}, series = {Journal of Vacuum Science and Technology A}, journal = {Journal of Vacuum Science and Technology A}, number = {34}, issn = {0734-2101}, doi = {10.1116/1.4936227}, pages = {01A127-1 -- 01A127-9}, abstract = {The process parameters' impact of the plasma-enhanced atomic layer deposition (PE-ALD) method on the oxygen to nitrogen (O/N) ratio in titanium oxynitride (TiOxNy) films was studied. Titanium(IV)isopropoxide in combination with NH3 plasma and tetrakis(dimethylamino) titanium by applying N2 plasma processes were investigated. Samples were characterized by the in situ spectroscopic ellipsometry, x-ray photoelectron spectroscopy, and electrical characterization (current-voltage: I-V and capacitance-voltage: C-V) methods. The O/N ratio in the TiOxNy films is found to be very sensitive for their electric properties such as conductivity, dielectric breakdown, and permittivity. Our results indicate that these PE-ALD film properties can be tuned, via the O/N ratio, by the selection of the process parameters and precursor/coreactant combination.}, language = {en} } @misc{SowinskaBrizziDasetal., author = {Sowinska, Małgorzata and Brizzi, Simone and Das, Chittaranjan and K{\"a}rkk{\"a}nen, Irina and Schneidewind, Jessica and Naumann, Franziska and Gargouri, Hassan and Henkel, Karsten and Schmeißer, Dieter}, title = {Analysis of nitrogen species in titanium oxynitride ALD films}, series = {Applied Surface Science}, volume = {381}, journal = {Applied Surface Science}, issn = {0169-4332}, doi = {10.1016/j.apsusc.2016.02.096}, pages = {42 -- 47}, abstract = {Titanium oxynitride films are prepared by plasma enhanced atomic layer deposition method using two different precursors and nitrogen sources. Synchrotron radiation-based X-ray photoelectron spectroscopy and X-ray absorption spectroscopy are used to characterize the nitrogen species incorporated within these films depending on the deposition parameters. It is found that nitrogen atoms in these films are differently bonded. In particular, it can be distinguished between Ti-ON and Ti-N bonding configurations and molecular nitrogen species caused by precursor fragments.}, language = {en} } @inproceedings{SowinskaDasWojciechowskietal., author = {Sowinska, Małgorzata and Das, Chittaranjan and Wojciechowski, Konrad and Snaith, Henry J. and Schmeißer, Dieter}, title = {XPS study of the ALD growth of Al₂O₃ on the CH₃NH₃PbI₃}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, pages = {S. 206}, abstract = {Organic-inorganic lead halide perovskites have emerged as very attractive absorber materials for the fabrication of low cost and high efficiency solar cells, but a delicate nature of these films is one of the main challenges for a successful commercialization. Typically, when exposed to air or moisture, perovskite films degrade within a couple of hours or days. Moreover, the methylammonium lead triiodide (CH₃NH₃PbI₃) perovskite cannot sustain a prolonged annealing at temperatures around 85∘C. In this work, we are investigating stability (upon air and thermal exposure) of a CH₃NH₃PbI₃ perovskite film coated with a thin layer of Al₂O₃ deposited by atomic layer deposition (ALD). In particular, the chemical and electronic changes occurred at the Al₂O₃/CH₃NH₃PbI₃ interface during the first 50 ALD cycles were monitored ex-situ by high-resolution and surface-sensitive synchrotron-based X-ray photoelectron spectroscopy (SR-XPS). The advantage of the ALD as a deposition method is that it can produce extremely dense layers with a very precise thickness control at room temperature. Detailed SR-XPS data analysis and a stability test of the perovskite film with alumina will be presented.}, language = {en} } @misc{SowinskaDasWojciechowskietal., author = {Sowinska, Małgorzata and Das, Chittaranjan and Wojciechowski, Konrad and Rouissi, Zied and Snaith, Henry J. and Schmeißer, Dieter}, title = {Atomic layer deposition of Al2O3 on CH3NH3PbI3 for enhancement of perovskite solar cells stability}, series = {Synchrotron Radiation in Natural Science : Bulletin of the Polish Synchrotron Radiation Society}, volume = {15}, journal = {Synchrotron Radiation in Natural Science : Bulletin of the Polish Synchrotron Radiation Society}, number = {1-2}, issn = {1644-7190}, pages = {S. 33}, language = {en} } @inproceedings{SowinskaDasWojciechowskietal., author = {Sowinska, Małgorzata and Das, Chittaranjan and Wojciechowski, Konrad and Snaith, Henry J. and Schmeißer, Dieter}, title = {Spectroscopic investigation of the nitrogen role in organic-inorganic perovskite films}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, pages = {S. 150}, abstract = {Over the past few years, a wide range of device architectures employing organic-inorganic metal halide perovskite absorbers has been reported, with efficiencies exceeding 20\%. Despite the tremendous progress, a number of key issues must be resolved before the wide-spread com- mercialization will be possible. Some of the primary challenges include lead toxicity, long-term stability, and fast degradation upon exposure to humid atmosphere. Recent computational and experimental studies suggest that hybrid metal-halide perovskites act as an ionic-electronic conductor. The study of vacancy-mediated migration of I-, Pb2+ and CH3NH3- ions and their relative activation energies suggests that migration of halide vacancies, to and from the interfaces in the solar cell during its operation, is the main conduction mechanism. In this work, we are presenting high resolution synchrotron-based spectroscopic study, which indicates that the contribution of nitrogen into the conduction mechanism of methyl ammonium lead iodide-based (CH3NH3PbI3) perovskite films should not be neglected. The N1s core level and resonant X-ray photoelectron spectroscopy at the N1s-egde of the CH3NH3PbI3 films are discussed in detail.}, language = {en} } @inproceedings{HenkelDasSowinskaetal., author = {Henkel, Karsten and Das, Chittaranjan and Sowinska, Małgorzata and Tallarida, Massimo and Schmeißer, Dieter and Gargouri, Hassan and K{\"a}rkk{\"a}nen, Irina and Schneidewind, Jessica and Gruska, Bernd and Arens, Michael}, title = {Charakterisierung von TiO2-ALD-Schichten und deren Nutzung f{\"u}r die Passivierung von Si-Photokathoden}, series = {Tagungsband Photovoltaik-Meeting: Anwendungen-Qualit{\"a}t-Perspektiven, Senftenberg, 15.04.2015}, booktitle = {Tagungsband Photovoltaik-Meeting: Anwendungen-Qualit{\"a}t-Perspektiven, Senftenberg, 15.04.2015}, editor = {Gl{\"u}ck, B. K. and Schmidt, S. and Stein, E. and Raschke, J{\"o}rg-Uwe and Richter, H.}, publisher = {BTU Cottbus-Senftenberg}, address = {Senftenberg}, pages = {3 -- 8}, abstract = {Wir berichten zun{\"a}chst {\"u}ber den Einfluss der Methode der Atomlagenabscheidung auf die TiO2-Schichteigenschaften. Insbesondere wird der Zusammenhang zwischen Ti3+- sowie Interbandzust{\"a}nden mit elektrischen Kennlinien und deren Einfluss auf funktionale Schichteigenschaften diskutiert. Anschließend werden Mikrostrukturierung, Grenzfl{\"a}chen-Engineering und konforme Abscheidung einer TiO2-ALD-Schutzschicht effektiv zur Performance-Steigerung von p-Si-Photokathoden angewendet.}, language = {de} }