@article{Sohal, author = {Sohal, Rakesh}, title = {Pr-Silicate formation on SiO2 covered SiC surfaces}, language = {de} } @misc{HenkelSohalTorcheetal., author = {Henkel, Karsten and Sohal, Rakesh and Torche, Mohamed and Paloumpa, Ioanna and M{\"u}ller, Klaus and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Grenzfl{\"a}chenoptimierung f{\"u}r funktionale D{\"u}nnschichtsysteme: Oxide und Polymere}, series = {Forum der Forschung}, volume = {9}, journal = {Forum der Forschung}, number = {18}, issn = {0947-6989}, pages = {49 -- 56}, language = {de} } @inproceedings{TallaridaSohalSchmeisser, author = {Tallarida, Massimo and Sohal, Rakesh and Schmeißer, Dieter}, title = {Resonant photoemission at the oxygen K edge as a tool to study the electronic properties of defects at SiO2/Si and SiO2/SiC interfaces}, language = {en} } @inproceedings{SohalTorcheSchmeisser, author = {Sohal, Rakesh and Torche, Mohamed and Schmeißer, Dieter}, title = {Al-Oxynitrides as a Buffer Layer for Pr2O3/SiC Interfaces}, language = {en} } @article{HenkelSohalSchmeisseretal., author = {Henkel, Karsten and Sohal, Rakesh and Schmeißer, Dieter and Schwiertz, Carola and Burkov, Yevgen and Torche, Mohamed}, title = {Al-oxynitride buffer layer facilities for PrOx/SiC interfaces}, language = {en} } @phdthesis{Sohal, author = {Sohal, Rakesh}, title = {CVD growth of (001) and (111) 3C-SiC epilayers and their interface reactivity with praseodymium oxide dielectric layers}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:co1-opus-121}, language = {en} } @misc{HenkelTorcheSohaletal., author = {Henkel, Karsten and Torche, Mohamed and Sohal, Rakesh and Karavaev, Konstantin and Burkov, Yevgen and Schwiertz, Carola and Schmeißer, Dieter}, title = {Pr-O-Al-N dielectrics for metal insulator semiconductor stacks}, language = {en} } @inproceedings{HenkelBurkovBergholzetal., author = {Henkel, Karsten and Burkov, Yevgen and Bergholz, Matthias and Karavaev, Konstantin and Sohal, Rakesh and Torche, Mohamed and Schmeißer, Dieter}, title = {Al-Oxynitride as a buffer layer for high-k dielectrics}, series = {Proceedings of 15th Workshop on Dielectrics in Microelectronics, Bad Saarow, 23 - 25 June 2008, Bad Saarow (Berlin)}, booktitle = {Proceedings of 15th Workshop on Dielectrics in Microelectronics, Bad Saarow, 23 - 25 June 2008, Bad Saarow (Berlin)}, pages = {161 -- 162}, language = {en} } @article{SohalLupinaLippertetal., author = {Sohal, Rakesh and Lupina, Grzegorz and Lippert, Gunther and Wenger, Christian and Seifarth, Olaf and Schr{\"o}der, Thomas and Tallarida, Massimo and Schmeißer, Dieter}, title = {Interface chemistry of high-k PrxAl2-xO3 (x=2-0) dielectrics on TiN for dynamic random access memory applications}, language = {en} } @article{TallaridaSohalSchmeisser, author = {Tallarida, Massimo and Sohal, Rakesh and Schmeißer, Dieter}, title = {Resonant photoemission at the Oxygen K edge as a tool to study the eletronic properties of defects at SiO2/Si and SiO2/SiC interfaces}, language = {en} }