@inproceedings{ZschechStegmannSchmeisseretal., author = {Zschech, Ehrenfried and Stegmann, Heiko and Schmeißer, Dieter and Hoffmann, Patrick}, title = {Chemical Bonding, Permittivity, and Elastic Properties in Locally Modified Organosilicate Glass}, language = {en} } @article{HoffmannWehnerSchmeisser, author = {Hoffmann, Patrick and Wehner, Stefan and Schmeißer, Dieter}, title = {Noise-Induced Spatiotemporal Patterns in a Bistable Reaction-Diffusion System: Photoelectron Emission Microscopy experiments and Modeling of the CO Oxidation Reaction on Ir(111)}, language = {en} } @article{SchmittBiermanSchmeisseretal., author = {Schmitt, Andrew L. and Bierman, Matthew J. and Schmeißer, Dieter and Himpsel, Franz J. and Jin, Song}, title = {Synthesis and Properties of Single-Crystal FeSi Nanowires}, language = {en} } @article{SchmittZhuSchmeisseretal., author = {Schmitt, Andrew L. and Zhu, Lei and Schmeißer, Dieter and Himpsel, Franz J. and Jin, Song}, title = {Metallic Single-Crystal CoSi Nanowires via Chemical Vapor Deposition of Single-Source Precursor}, language = {en} } @article{LupinaSchroederSchmeisseretal., author = {Lupina, Grzegorz and Schroeder, Thomas and Schmeißer, Dieter and Dabrowski, Jarek Marek}, title = {Praseodymium Silicate Films on Si(100) for Gate Dielectric Applications: Physical and Electrical Characterization}, language = {en} } @inproceedings{TallaridaSchmeisserZheng, author = {Tallarida, Massimo and Schmeißer, Dieter and Zheng, Fan}, title = {X-ray Absorption and Photoemission Spectroscopy of 3C- and 4H-SiC}, language = {en} } @inproceedings{TallaridaSohalSchmeisser, author = {Tallarida, Massimo and Sohal, Rakesh and Schmeißer, Dieter}, title = {Resonant photoemission at the oxygen K edge as a tool to study the electronic properties of defects at SiO2/Si and SiO2/SiC interfaces}, language = {en} } @article{SchmeisserZschech, author = {Schmeißer, Dieter and Zschech, Ehrenfried}, title = {Silicate Formation at the Interface of Hf-Oxide and Pr-Oxide as a High-k Dielectric and Si(001) surfaces}, language = {en} } @inproceedings{SohalTorcheSchmeisser, author = {Sohal, Rakesh and Torche, Mohamed and Schmeißer, Dieter}, title = {Al-Oxynitrides as a Buffer Layer for Pr2O3/SiC Interfaces}, language = {en} } @article{TorcheHenkelSchmeisser, author = {Torche, Mohamed and Henkel, Karsten and Schmeißer, Dieter}, title = {The interaction of Al, Ag, Au and Ti to Pr2O3 thin film dielectrics}, language = {en} } @misc{SeifarthBurkovSchmeisseretal., author = {Seifarth, Olaf and Burkov, Yevgen and Schmeißer, Dieter and Stamm, Manfred}, title = {Metallic nickel nanorod arrays embedded into ordered block copolymer templates}, series = {Thin Solid Films}, volume = {515}, journal = {Thin Solid Films}, number = {16}, issn = {0040-6090}, pages = {6552 -- 6556}, language = {en} } @misc{SchroederLupinaSeifarthetal., author = {Schroeder, Thomas and Lupina, Grzegorz and Seifarth, Olaf and Tallarida, Massimo and Schmeißer, Dieter}, title = {Synchrotron radiation x-ray photoelectron spectroscopy study on the interface chemistry of high-k PrxAl2-xO3 (x=0-2) dielectrics on TiN for dynamic random access memory applications}, series = {Journal of Applied Physics}, volume = {102}, journal = {Journal of Applied Physics}, number = {1}, issn = {0021-8979}, pages = {014103}, language = {en} } @article{HenkelSohalSchmeisseretal., author = {Henkel, Karsten and Sohal, Rakesh and Schmeißer, Dieter and Schwiertz, Carola and Burkov, Yevgen and Torche, Mohamed}, title = {Al-oxynitride buffer layer facilities for PrOx/SiC interfaces}, language = {en} } @article{MuellerHenkelSchmeisser, author = {M{\"u}ller, Klaus and Henkel, Karsten and Schmeißer, Dieter}, title = {Organic field effect transistors with ferroelectric hysteresis}, language = {en} } @article{MuellerMandalSchmeisser, author = {M{\"u}ller, Klaus and Mandal, Dipankar and Schmeißer, Dieter}, title = {No interfacial layer for PEDOT electrodes on PVDF: Characterization of reactions at the interface P(VDF/TrFE)/Al and P(VDF/TrFE)/PEDOT:PSS}, language = {en} } @article{SchmeisserBierman, author = {Schmeißer, Dieter and Bierman, Matthew J.}, title = {Ferromagnetic Semiconducting EuO Nanorods}, language = {en} } @inproceedings{SchmeisserWehnerHoffmannetal., author = {Schmeißer, Dieter and Wehner, Stefan and Hoffmann, Patrick and Brand, Helmut R. and K{\"u}ppers, J{\"u}rgen}, title = {Influence of the Substrate on the Pattern Formation of a Surface Reaction}, series = {Nonequilibrium statistical mechanics and nonlinear physics, XV Conference on Nonequilibrium Statistical Mechanics and Nonlinear Physics, Mar del Plata, Argentina, 4 - 8 December 2006}, booktitle = {Nonequilibrium statistical mechanics and nonlinear physics, XV Conference on Nonequilibrium Statistical Mechanics and Nonlinear Physics, Mar del Plata, Argentina, 4 - 8 December 2006}, editor = {Descalzi, Orazio}, publisher = {AIP Publishing}, address = {Melville, New York}, isbn = {978-0-7354-0421-2}, pages = {121 -- 126}, language = {en} } @article{MuellerSeiboldSchmeisser, author = {M{\"u}ller, Sebastian and Seibold, G{\"o}tz and Schmeißer, Dieter}, title = {Preparation and Characterization of TiO2 Thin Films and Cr and Co Doped TiO2 Thin Films}, editor = {Vierhaus, Heinrich Theodor}, language = {en} } @misc{TallaridaSchmeisser, author = {Tallarida, Massimo and Schmeißer, Dieter}, title = {Study of Bulk and Interface Defects in Silicon Oxide with X-ray Absorption Spectroscopy}, series = {Materials Science and Engineering : B}, volume = {144}, journal = {Materials Science and Engineering : B}, number = {1-3}, issn = {0921-5107}, pages = {23 -- 26}, language = {en} } @article{BeckHoffmannSchmeisseretal., author = {Beck, Romuald B. and Hoffmann, Patrick and Schmeißer, Dieter and Bieniek, Tomasz and Jakubowski, Andrzej}, title = {Composition and Electrical Properties of Ultra-Thin SiOxNy Layers Formed by rf Plasma Nitrogen Implantation/Plasma Oxidation Processes}, language = {en} } @article{MroczynskiHoffmannSchmeisser, author = {Mroczynski, Robert and Hoffmann, Patrick and Schmeißer, Dieter}, title = {The Influence of Annealing (900 Grad C) of Ultra-Thin PECVD Silicon Oxynitride Layers}, language = {en} } @article{SchmeisserMroczynskiBieniek, author = {Schmeißer, Dieter and Mroczynski, Robert and Bieniek, Tomasz}, title = {Comparison of Composition of Ultra-Thin Silicon Oxynitride Layers´ fabricated by PECVD and Ultrashallow rf Plasma Ion Implantation}, language = {en} } @article{SchmeisserBurkovPaloumpaetal., author = {Schmeißer, Dieter and Burkov, Yevgen and Paloumpa, Ioanna and Mandal, Dipankar and Henkel, Karsten}, title = {Microscopic and Spectroscopic Characterization of Interfaces and Dielectric Layers for OFET Devices}, language = {en} } @article{SchmeisserHenkelKaravaev, author = {Schmeißer, Dieter and Henkel, Karsten and Karavaev, Konstantin}, title = {Al-Oxynitride Interfacial Layer Investigations for PrxOy on SiC and Si}, language = {en} } @article{SchmeisserDomaradzkiKaczmareketal., author = {Schmeißer, Dieter and Domaradzki, Jarosław and Kaczmarek, Danuta and Borkowska, Angnieszka and M{\"u}ller, Sebastian}, title = {Influence of Annealing on the Structure and Stoichiometry of Europium-Doped Titanium Dioxide Thin Films}, language = {en} } @misc{SchmeisserMuellerSeifarthetal., author = {Schmeißer, Dieter and M{\"u}ller, S. and Seifarth, Olaf and Dabrowski, Jarek Marek and M{\"u}ssig, Hans-Joachim and Schroeder, Thomas}, title = {On the band gaps and electronic structure of thin single crystalline praseodymium oxide layers on Si(111)}, series = {Journal of vacuum science \& technology / B}, volume = {27}, journal = {Journal of vacuum science \& technology / B}, number = {1}, pages = {271 -- 276}, language = {en} } @misc{HenkelTorcheSohaletal., author = {Henkel, Karsten and Torche, Mohamed and Sohal, Rakesh and Karavaev, Konstantin and Burkov, Yevgen and Schwiertz, Carola and Schmeißer, Dieter}, title = {Pr-O-Al-N dielectrics for metal insulator semiconductor stacks}, language = {en} } @misc{MuellerHenkelMandaletal., author = {M{\"u}ller, Klaus and Henkel, Karsten and Mandal, Dipankar and Seime, Bernd and Paloumpa, Ioanna and Schmeißer, Dieter}, title = {Spin coated organic ferroelectric films for non volatile memories}, language = {en} } @misc{SeifarthSchubertGiussanietal., author = {Seifarth, Olaf and Schubert, Markus Andreas and Giussani, A. and Klenov, D. O. and Schmeißer, Dieter and Schroeder, Thomas}, title = {Single crystalline Pr2-xYxO3 (x=0-2)dielectrics on Si with tailored electronic and crystallographic structure}, volume = {108}, number = {10}, issn = {1089-7550}, pages = {103709}, language = {en} } @misc{MandalHenkelMuelleretal., author = {Mandal, Dipankar and Henkel, Karsten and M{\"u}ller, Klaus and Schmeißer, Dieter}, title = {Band gab determination of P(VDF-TrFE) copolymer film by electron energy loss spectroscopy}, language = {en} } @misc{SionckeLinBrammertzetal., author = {Sioncke, Sonja and Lin, Hang-Chu and Brammertz, Guy and Delabie, Annelies and Conard, Thierry and Franquet, Alexis and Caymax, Matty and Meuris, Marc and Schmeißer, Dieter and Tallarida, Massimo}, title = {ALD on high mobility channels: engineering the proper gate stack passivation}, series = {ECS Transactions}, volume = {33}, journal = {ECS Transactions}, number = {2}, issn = {1938-5862}, pages = {9 -- 23}, language = {en} } @misc{KolanekTallaridaKaravaevetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Karavaev, Konstantin and Schmeißer, Dieter}, title = {In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope}, language = {en} } @misc{HoZschechSchmeisseretal., author = {Ho, Paul S. and Zschech, Ehrenfried and Schmeißer, Dieter and Meyer, Moritz Andreas and Huebner, Rene and Hauschildt, Meike and Zhang, Lijuan and Gall, Martin and Kraatz, Matthias}, title = {Scaling effects on microstructure and reliability for cu interconnects}, language = {en} } @misc{WehnerKarpitschkaBurkovetal., author = {Wehner, Stefan and Karpitschka, Stefan and Burkov, Yevgen and Schmeißer, Dieter and K{\"u}ppers, J{\"u}rgen and Brand, Helmut R.}, title = {Stochastic aspects of pattern formation during the catalytic oxidation of CO on Pd(111)}, language = {en} } @misc{HenkelSeimePaloumpaetal., author = {Henkel, Karsten and Seime, Bernd and Paloumpa, Ioanna and M{\"u}ller, Klaus and Schmeißer, Dieter}, title = {Buffer layer incestigaions on MFIS capacitors consisting of ferroelectric poly[vinylidene fluoride trifluoroethylene]}, series = {IOP conference series : Materials Science and Engineering}, volume = {8}, journal = {IOP conference series : Materials Science and Engineering}, number = {1}, issn = {1757-899X}, pages = {012036}, language = {en} } @misc{SchmeisserHenkelBergholzetal., author = {Schmeißer, Dieter and Henkel, Karsten and Bergholz, Matthias and Tallarida, Massimo}, title = {The band gab and band offset in ultrathin oxide-semiconductor heterostructures}, language = {en} } @inproceedings{MuellerSchmeisser, author = {M{\"u}ller, Sebastian and Schmeißer, Dieter}, title = {Synchrotron radiation spectroscopy studies of ultrathin chromium films on titanium dioxide}, series = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, booktitle = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4244-4303-1}, pages = {64 -- 68}, language = {en} } @inproceedings{KolanekTallaridaKaravaevetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Karavaev, Konstantin and Schmeißer, Dieter}, title = {In situ measurements of the atomic layer deposition of high-k dielectrics by atomic force microscope for advanced microsystems}, series = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, booktitle = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4244-4303-1}, pages = {47 -- 51}, language = {en} } @inproceedings{KlocekFriedrichSchmeisseretal., author = {Klocek, Jolanta and Friedrich, Daniel and Schmeißer, Dieter and Hecker, Michael and Zschech, Ehrenfried}, title = {The stability of C60 and its derivatives upon handling in microsystems technologies}, series = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, booktitle = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4244-4303-1}, pages = {43 -- 46}, language = {en} } @inproceedings{TallaridaKaravaevKolaneketal., author = {Tallarida, Massimo and Karavaev, Konstantin and Kolanek, Krzysztof and Schmeißer, Dieter}, title = {Nobel "in-situ2" Approach to Modified ALD Processes for Nano-functional Metals Oxide Films}, language = {en} } @incollection{SchwiertzHenkelBleietal., author = {Schwiertz, Carola and Henkel, Karsten and Blei, S. and Heidenreich, R. and Schmeißer, Dieter}, title = {Nachweis von Aerosolen (<1µm) mit Schwingquarzimpedanzspektroskopie}, language = {de} } @misc{ZschechHoSchmeisseretal., author = {Zschech, Ehrenfried and Ho, O. S. and Schmeißer, Dieter and Meyer, Moritz Andreas and Vairagar, A. V. and Schneider, G. and Hauschildt, Meike and Kraatz, Matthias and Sukharev, V.}, title = {Geometry and Microstructure Effect on EM-Induced Copper Interconnect Degradation}, series = {IEEE Transactions on Device and Materials Reliability}, volume = {9}, journal = {IEEE Transactions on Device and Materials Reliability}, number = {1}, issn = {1530-4388}, pages = {20 -- 30}, language = {en} } @inproceedings{HeimFriedrichGuttmannetal., author = {Heim, S. and Friedrich, Daniel and Guttmann, P. and Rehbein, S. and Chumakov, Dmytro and Ritz, Y. and Schneider, G. and Schmeißer, Dieter and Zschech, Ehrenfried}, title = {Dynamical X-ray Microscopy Study of Stress-Induced Voiding in Cu Interconnects}, language = {en} } @misc{SchmeisserHenkelMuelleretal., author = {Schmeißer, Dieter and Henkel, Karsten and M{\"u}ller, Klaus and Tallarida, Massimo}, title = {Interface Reactions in Ultrathin Functional Dielectric Films}, language = {en} } @misc{SchmeisserTallaridaHenkeletal., author = {Schmeißer, Dieter and Tallarida, Massimo and Henkel, Karsten and M{\"u}ller, Klaus and Mandal, Dipankar and Chumakov, Dmytro and Zschech, Ehrenfried}, title = {Characterization of oxidic and organic materials with synchrotron radiation based XPS and XAS}, language = {en} } @misc{LazarevaKovalMuelleretal., author = {Lazareva, I. and Koval, Yuri and M{\"u}ller, P. and M{\"u}ller, Klaus and Henkel, Karsten and Schmeißer, Dieter}, title = {Interface screening and imprint in pol(vinylidene fluoride/trifluoroethylene) ferroelectric field effect transistors}, language = {en} } @incollection{MuellerBurkovMandaletal., author = {M{\"u}ller, Klaus and Burkov, Yevgen and Mandal, Dipankar and Henkel, Karsten and Paloumpa, Ioanna and Goryachko, Andriy and Schmeißer, Dieter}, title = {Microscopic and spectroscopic characterization of interfaces and dielectric layers for OFET devices}, series = {Organic Electronics : structural and Electronic Properties of OFETs}, booktitle = {Organic Electronics : structural and Electronic Properties of OFETs}, editor = {W{\"o}ll, Christof}, publisher = {Wiley-VCH}, address = {Weinheim}, isbn = {978-3-527-40810-8}, pages = {445 -- 468}, language = {en} } @misc{TallaridaKaravaevSchmeisser, author = {Tallarida, Massimo and Karavaev, Konstantin and Schmeißer, Dieter}, title = {HfO2/Si interface formation in atomic layer deposition films: an in situ investigation}, language = {en} } @misc{HenkelLazarevaMandaletal., author = {Henkel, Karsten and Lazareva, I. and Mandal, Dipankar and Paloumpa, Ioanna and M{\"u}ller, Klaus and Koval, Yuri and M{\"u}ller, P. and Schmeißer, Dieter}, title = {Electrical investigations on metal/ferroelectric/insulator/semiconductor structures using Poly[vinylidene fluoride trifluoroethylene] as ferroelectric layer for organic nonvolatile memory applications}, language = {en} } @misc{HenkelBurkovKaravaevetal., author = {Henkel, Karsten and Burkov, Yevgen and Karavaev, Konstantin and Torche, Mohamed and Schwiertz, Carola and Schmeißer, Dieter}, title = {Optimization of the AION buffer layer for PrxOy/Si stacks}, language = {de} } @article{BieniekBeckJakubowskietal., author = {Bieniek, Tomasz and Beck, Romuald B. and Jakubowski, Andrzej and Konarski, Piotr and Cwil, M. and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Application of r.f. plasma ultrashallow nitrogen ion implantation for pedestal oxynitride layer formation}, language = {en} }