@misc{TallaridaSchmeisser, author = {Tallarida, Massimo and Schmeißer, Dieter}, title = {Study of Bulk and Interface Defects in Silicon Oxide with X-ray Absorption Spectroscopy}, series = {Materials Science and Engineering : B}, volume = {144}, journal = {Materials Science and Engineering : B}, number = {1-3}, issn = {0921-5107}, pages = {23 -- 26}, language = {en} } @article{BeckHoffmannSchmeisseretal., author = {Beck, Romuald B. and Hoffmann, Patrick and Schmeißer, Dieter and Bieniek, Tomasz and Jakubowski, Andrzej}, title = {Composition and Electrical Properties of Ultra-Thin SiOxNy Layers Formed by rf Plasma Nitrogen Implantation/Plasma Oxidation Processes}, language = {en} } @article{MroczynskiHoffmannSchmeisser, author = {Mroczynski, Robert and Hoffmann, Patrick and Schmeißer, Dieter}, title = {The Influence of Annealing (900 Grad C) of Ultra-Thin PECVD Silicon Oxynitride Layers}, language = {en} } @article{SchmeisserMroczynskiBieniek, author = {Schmeißer, Dieter and Mroczynski, Robert and Bieniek, Tomasz}, title = {Comparison of Composition of Ultra-Thin Silicon Oxynitride Layers´ fabricated by PECVD and Ultrashallow rf Plasma Ion Implantation}, language = {en} } @article{SchmeisserBurkovPaloumpaetal., author = {Schmeißer, Dieter and Burkov, Yevgen and Paloumpa, Ioanna and Mandal, Dipankar and Henkel, Karsten}, title = {Microscopic and Spectroscopic Characterization of Interfaces and Dielectric Layers for OFET Devices}, language = {en} } @article{SchmeisserHenkelKaravaev, author = {Schmeißer, Dieter and Henkel, Karsten and Karavaev, Konstantin}, title = {Al-Oxynitride Interfacial Layer Investigations for PrxOy on SiC and Si}, language = {en} } @article{SchmeisserDomaradzkiKaczmareketal., author = {Schmeißer, Dieter and Domaradzki, Jarosław and Kaczmarek, Danuta and Borkowska, Angnieszka and M{\"u}ller, Sebastian}, title = {Influence of Annealing on the Structure and Stoichiometry of Europium-Doped Titanium Dioxide Thin Films}, language = {en} } @misc{SchmeisserMuellerSeifarthetal., author = {Schmeißer, Dieter and M{\"u}ller, S. and Seifarth, Olaf and Dabrowski, Jarek Marek and M{\"u}ssig, Hans-Joachim and Schroeder, Thomas}, title = {On the band gaps and electronic structure of thin single crystalline praseodymium oxide layers on Si(111)}, series = {Journal of vacuum science \& technology / B}, volume = {27}, journal = {Journal of vacuum science \& technology / B}, number = {1}, pages = {271 -- 276}, language = {en} } @misc{HenkelTorcheSohaletal., author = {Henkel, Karsten and Torche, Mohamed and Sohal, Rakesh and Karavaev, Konstantin and Burkov, Yevgen and Schwiertz, Carola and Schmeißer, Dieter}, title = {Pr-O-Al-N dielectrics for metal insulator semiconductor stacks}, language = {en} } @misc{MuellerHenkelMandaletal., author = {M{\"u}ller, Klaus and Henkel, Karsten and Mandal, Dipankar and Seime, Bernd and Paloumpa, Ioanna and Schmeißer, Dieter}, title = {Spin coated organic ferroelectric films for non volatile memories}, language = {en} } @misc{SeifarthSchubertGiussanietal., author = {Seifarth, Olaf and Schubert, Markus Andreas and Giussani, A. and Klenov, D. O. and Schmeißer, Dieter and Schroeder, Thomas}, title = {Single crystalline Pr2-xYxO3 (x=0-2)dielectrics on Si with tailored electronic and crystallographic structure}, volume = {108}, number = {10}, issn = {1089-7550}, pages = {103709}, language = {en} } @misc{MandalHenkelMuelleretal., author = {Mandal, Dipankar and Henkel, Karsten and M{\"u}ller, Klaus and Schmeißer, Dieter}, title = {Band gab determination of P(VDF-TrFE) copolymer film by electron energy loss spectroscopy}, language = {en} } @misc{SionckeLinBrammertzetal., author = {Sioncke, Sonja and Lin, Hang-Chu and Brammertz, Guy and Delabie, Annelies and Conard, Thierry and Franquet, Alexis and Caymax, Matty and Meuris, Marc and Schmeißer, Dieter and Tallarida, Massimo}, title = {ALD on high mobility channels: engineering the proper gate stack passivation}, series = {ECS Transactions}, volume = {33}, journal = {ECS Transactions}, number = {2}, issn = {1938-5862}, pages = {9 -- 23}, language = {en} } @misc{KolanekTallaridaKaravaevetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Karavaev, Konstantin and Schmeißer, Dieter}, title = {In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope}, language = {en} }