@article{RatzkeReif, author = {Ratzke, Markus and Reif, J{\"u}rgen}, title = {On the reliability of scanning probe based electrostatic force measurements}, language = {en} } @article{VarlamovaCostacheRatzkeetal., author = {Varlamova, Olga and Costache, Florenta Adriana and Ratzke, Markus and Reif, J{\"u}rgen}, title = {Control parameters in pattern formation upon femtosecond laser ablation}, language = {en} } @misc{SchmidMankovicsArguirovetal., author = {Schmid, Reiner P. and Mankovics, Daniel and Arguirov, Tzanimir V. and Ratzke, Markus and Mtchedlidze, T. and Kittler, Martin}, title = {Rapid dislocation-related D1-photoluminescence imaging of multicrystalline Si wafers at room temperature}, series = {Physica Status Solidi : A}, volume = {208}, journal = {Physica Status Solidi : A}, number = {4}, issn = {1610-1642}, doi = {10.1002/pssa.201026269}, pages = {888 -- 892}, language = {en} } @misc{YuArguirovKittleretal., author = {Yu, Xuegong and Arguirov, Tzanimir V. and Kittler, Martin and Seifert, Winfried and Ratzke, Markus and Reiche, Manfred}, title = {Properties of dislocation networks formed by Si wafer direct bonding}, series = {Materials Science in Semiconductor Processing}, volume = {9}, journal = {Materials Science in Semiconductor Processing}, number = {1-3}, doi = {10.1016/j.mssp.2006.01.070}, pages = {96 -- 101}, language = {en} } @misc{LippertDabrowskiOberbecketal., author = {Lippert, Gunther and Dabrowski, Jarek Marek and Oberbeck, Lars and Schroeder, Uwe and Costina, Ioan and Lupina, Grzegorz and Ratzke, Markus and Zaumseil, Peter and M{\"u}ssig, Hans-Joachim}, title = {Morphology and composition of selected high-k materials and their relevance to dielectric properties of thin films}, series = {Journal of the electrochemical society}, volume = {155}, journal = {Journal of the electrochemical society}, number = {5}, issn = {1945-7111}, doi = {10.1149/1.2875741}, pages = {G97 -- G114}, language = {en} } @misc{KlossekMankovicsArguirovetal., author = {Klossek, Andre and Mankovics, Daniel and Arguirov, Tzanimir V. and Ratzke, Markus and Kirner, Simon and Friedrich, Felice and Gabriel, Onno and Stannowski, Bernd and Schlatmann, Rutger and Kittler, Martin}, title = {Growth process of microcrystalline silicon studied by combined photoluminsescence and Raman investigations}, series = {Journal of applied physics}, volume = {114}, journal = {Journal of applied physics}, issn = {1520-8850}, doi = {10.1063/1.4838058}, pages = {223511}, language = {en} } @misc{ReifVarlamovaRatzkeetal., author = {Reif, J{\"u}rgen and Varlamova, Olga and Ratzke, Markus and Uhlig, Sebastian}, title = {Laser-Induced Periodic Surface Structures of Thin Complex Multi-Component Films}, series = {Applied Physics / A}, volume = {122}, journal = {Applied Physics / A}, number = {4}, issn = {1432-0630}, doi = {10.1007/s00339-016-9936-7}, pages = {1 -- 6}, language = {en} } @misc{VarlamovaMartensRatzkeetal., author = {Varlamova, Olga and Martens, Christian and Ratzke, Markus and Reif, J{\"u}rgen}, title = {Genesis of femtosecond-induced nanostructures on solid surfaces}, series = {Applied Optics}, volume = {53}, journal = {Applied Optics}, number = {31}, issn = {1539-4522}, pages = {I10 -- I15}, language = {en} } @misc{RatzkeMchedlidzeArguirovetal., author = {Ratzke, Markus and Mchedlidze, Teimuraz and Arguirov, Tzanimir V. and Acharya, N. and Kittler, Martin and Reif, J{\"u}rgen}, title = {Scanning probe studies of amorphous silicon subjected to laser annealing}, series = {Physica status solidi (C)}, volume = {8}, journal = {Physica status solidi (C)}, number = {4}, issn = {1610-1642}, pages = {1351 -- 1355}, language = {en} } @misc{CostacheRatzkeWolfframmetal., author = {Costache, Florenta Adriana and Ratzke, Markus and Wolfframm, Dirk and Reif, J{\"u}rgen}, title = {Femtosecond laser ionization mass spectrometric analysis of layers grown by pulsed laser deposition}, series = {Applied Surface Science}, volume = {247}, journal = {Applied Surface Science}, number = {1-4}, issn = {0169-4332}, pages = {249 -- 255}, language = {en} } @misc{MuellerGoryachkoBurkovetal., author = {M{\"u}ller, K. and Goryachko, Andriy and Burkov, Yevgen and Schwiertz, Carola and Ratzke, Markus and K{\"o}ble, J. and Reif, J{\"u}rgen and Schmeißer, Dieter}, title = {Scanning Kelvin probe and photoemission electron microscopy of organic source-drain structures}, series = {Synthetic Metals}, volume = {146}, journal = {Synthetic Metals}, number = {3}, pages = {377 -- 382}, language = {en} } @misc{ReifMartensUhligetal., author = {Reif, J{\"u}rgen and Martens, Christian and Uhlig, Sebastian and Ratzke, Markus and Varlamova, Olga and Valette, Stephane and Benayoun, Stephane}, title = {On large area LIPSS coverage by multiple pulses}, series = {Applied Surface Science}, volume = {336}, journal = {Applied Surface Science}, issn = {0169-4332}, doi = {doi:10.1016/j.apsusc.2014.11.153}, pages = {249 -- 254}, language = {en} } @misc{WolfframmRatzkeKoutevaArguirovaetal., author = {Wolfframm, Dirk and Ratzke, Markus and Kouteva-Arguirova, Simona and Reif, J{\"u}rgen}, title = {Praseodymium Oxide growth on Si(100) by pulsed laser deposition}, series = {Materials Science and Semiconductor Processing}, volume = {5}, journal = {Materials Science and Semiconductor Processing}, number = {4-5}, issn = {1369-8001}, pages = {429 -- 434}, language = {en} } @phdthesis{Ratzke, author = {Ratzke, Markus}, title = {Kraftmikroskopie als Werkzeug zur Charakterisierung elektrischer Oberfl{\"a}cheneigenschaften}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:co1-opus-24440}, pages = {169}, language = {de} } @misc{ObrosovGulyaevZaketal., author = {Obrosov, Aleksei and Gulyaev, Roman and Zak, Andrzej and Ratzke, Markus and Naveed, Muhammad and Dudzinski, Wlodzimierz and Weiß, Sabine}, title = {Chemical and Morphological Characterization of Magnetron Sputtered at Different Bias Voltages Cr-Al-C Coatings}, series = {Materials}, volume = {10}, journal = {Materials}, number = {2}, issn = {1996-1944}, doi = {10.3390/ma10020156}, pages = {156}, abstract = {MAX phases (M = transition metal, A = A-group element, and X = C/N) are of special interest because they possess a unique combination of the advantages of both metals and ceramics. Most attention is attracted to the ternary carbide Cr2AlC because of its excellent high-temperature oxidation, as well as hot corrosion resistance. Despite lots of publications, up to now the influence of bias voltage on the chemical bonding structure, surface morphology, and mechanical properties of the film is still not well understood. In the current study, Cr-Al-C films were deposited on silicon wafers (100) and Inconel 718 super alloy by dc magnetron sputtering with different substrate bias voltages and investigated using Scanning Electron Microscopy (SEM), X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), and nanoindentation. Transmission Electron Microscopy (TEM) was used to analyze the correlation between the growth of the films and the coating microstructure. The XPS results confirm the presence of Cr2AlC MAX phase due to a negative shift of 0.6-0.9 eV of the Al2p to pure aluminum carbide peak. The XRD results reveal the presence of Cr2AlC MAX Phase and carbide phases, as well as intermetallic AlCr2. The film thickness decreases from 8.95 to 6.98 µm with increasing bias voltage. The coatings deposited at 90 V exhibit the lowest roughness (33 nm) and granular size (76 nm) combined with the highest hardness (15.9 GPa). The ratio of Al carbide to carbide-like carbon state changes from 0.12 to 0.22 and correlates with the mechanical properties of the coatings. TEM confirms the columnar structure, with a nanocrystalline substructure, of the films.}, language = {en} }