@misc{HeinrichBalanzateguiBensetal., author = {Heinrich, Ingo and Balanzategui, Daniel and Bens, Oliver and Blasch, Gerald and Blume, Theresa and B{\"o}ttcher, Falk and Borg, Erik and Brademann, Brian and Brauer, Achim and Conrad, Christopher and Dietze, Elisabeth and Dr{\"a}ger, Nadine and Fiener, Peter and Gerke, Horst H. and G{\"u}ntner, Andreas and Heine, Iris and Helle, Gerhard and Herbrich, Marcus and Harfenmeister, Katharina and Heußner, Karl-Uwe and Hohmann, Christian and Itzerott, Sibylle and Jurasinski, Gerald and Kaiser, Knut and Kappler, Christoph and Koebsch, Franziska and Liebner, Susanne and Lischeid, Gunnar and Merz, Bruno and Missling, Klaus Dieter and Morgner, Markus and Pinkerneil, Sylvia and Plessen, Birgit and Raab, Thomas and Ruhtz, Thomas and Sachs, Torsten and Sommer, Michael and Spengler, Daniel and Stender, Vivien and St{\"u}ve, Peter and Wilken, Florian}, title = {Interdisciplinary Geo-ecological Research across Time Scales in the Northeast German Lowland Observatory (TERENO-NE)}, series = {Vadose Zone Journal}, volume = {17}, journal = {Vadose Zone Journal}, number = {1}, issn = {1539-1663}, doi = {10.2136/vzj2018.06.0116}, pages = {1 -- 25}, language = {en} } @inproceedings{SeifarthWalczykLupinaetal., author = {Seifarth, Olaf and Walczyk, Christian and Lupina, Grzegorz and Dabrowski, Jaroslaw and Weidner, G{\"u}nter and Zaumseil, Peter and Schmeißer, Dieter and Storck, Peter and M{\"u}ssig, Hans-Joachim and Schroeder, Thomas}, title = {On the electronic and dielectric characterisation of thin cubic PrO2 layers on Silicon}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 43}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 43}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, pages = {S. 196}, abstract = {For the integration of 100 \% Ge onto the Si platform, a buffer oxide approach has been developed recently, using rare earth oxides to tune the lattice constant between the Si and the Ge. Among these buffer oxides, PrO2 is a prospective candidate with high quality crystalline growth on Si, moderated by an interfacial Pr-silicate between. In order to specify electronic properties of thin PrO2 and its interface on Si(111), especially the width of the band gap, we performed synchrotron radiation based XPS, UPS and XAS measurements at the U49/2 PGM 2 beamline at BESSY II and correlate the results with our structural characterisation performed by TEM and XRD. In order to evaluate the dielectric properties of thin PrO2 layers on Si(111), we performed temperature-, time-, voltage-, and layer thickness-dependent leakage current measurements (J-V). Here, we identified relaxation behaviour in the leakage current, successfully addressed to defect like states inside the Pr-silicate interface layer, corroborated by frequency dependent capacitance versus voltage (C-V) measurements.}, language = {en} } @misc{LupinaDabrowskiFormaneketal., author = {Lupina, Grzegorz and Dabrowski, Jarek Marek and Formanek, Peter and Schmeißer, Dieter and Sorge, Roland and Wenger, Christian and Zaumseil, Peter and M{\"u}ssig, Hans-Joachim}, title = {Solid-state reaction between Pr and SiO2 studied by photoelectron spectroscopy and ab initio calculations}, series = {Materials Science in Semiconductor Processing}, volume = {7}, journal = {Materials Science in Semiconductor Processing}, number = {4-6}, issn = {1369-8001}, pages = {215 -- 220}, abstract = {We report on the structural and electrical properties of Pr-based high-k dielectric films fabricated by solid-state reaction between metallic Pr and SiO2 underlayers. A non-destructive depth profiling using synchrotron radiation excited photoelectron spectroscopy (SR-PES), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) were employed to examine the chemical composition and microstructure. Ab initio calculations were done to gain insight into the physical processes involved. SR-PES results indicate that Pr deposition at room temperature (RT) leads to the formation of a Pr silicide and a Pr oxide, what is in good agreement with the scenario expected from ab initio calculations. As revealed by TEM and electrical measurements, oxidation of the reacted structures, followed by annealing, results in a stacked dielectric composed of a SiO2-based buffer with an enhanced permittivity and a Pr silicate film with a high dielectric constant. The leakage current density of 10-4 A/cm2 was measured for stacks with capacitance equivalent thickness (CET) of 1.5 nm prepared by evaporation of the Pr layer on a 1.8 nm SiO2 film, followed by oxidation in air ambient and annealing in N2 atmosphere. The capacitance-voltage (C-V) curves exhibit a large flatband voltage (VFB) shift indicating the presence of a positive charge in the stack. Switching away from the Al contacts to Au gate electrodes introduces a significant reduction of the VFB by 1.3 eV, what is much more than the change expected from the work function difference between Al and Au (not, vert, similar0.9 eV). This in turn implies that VFB is strongly affected by the gate interface electrode.}, language = {en} } @misc{MuessigDabrowskiWengeretal., author = {M{\"u}ssig, Hans-Joachim and Dabrowski, Jarek Marek and Wenger, Christian and Lupina, Grzegorz and Sorge, Roland and Formanek, Peter and Zaumseil, Peter and Schmeißer, Dieter}, title = {Ultrathin Dielectric Films Grown by Solid Phase Reaction of Pr with SiO2}, series = {MRS Proceedings}, volume = {811}, journal = {MRS Proceedings}, issn = {1946-4274}, pages = {D7.10.}, language = {en} } @misc{LuetznerLangeSchmittetal., author = {L{\"u}tzner, J{\"o}rg and Lange, Toni and Schmitt, Jochen and Kopkow, Christian and Dreinh{\"o}fer, Karsten E and Friederich, Niklaus F. and Gravius, Sascha and Heller, Karl-Dieter and Hube, Robert and Gromnica-Ihle, Erika and Kirschner, Stephan and Kladny, Bernd and Kremer, Michael and Linke, Maike and Malzahn, J{\"u}rgen and Sabatowski, Rainer and Scharf, Hanns-Peter and St{\"o}ve, Johannes and Wagner, Richard and G{\"u}nther, Klaus-Peter}, title = {[The S2k guideline: Indications for knee endoprosthesis : Evidence and consent-based indications for total knee arthroplasty]}, series = {Der Orthop{\"a}de}, volume = {47}, journal = {Der Orthop{\"a}de}, number = {9}, issn = {1433-0431}, doi = {10.1007/s00132-018-3612-x}, pages = {777 -- 781}, language = {en} } @incollection{EberhardBestle, author = {Eberhard, Peter and Bestle, Dieter}, title = {Computer-Aided Optimization of Mechanical Systems}, language = {en} } @inproceedings{DuttaFlassigBestle, author = {Dutta, Amit Kumar and Flassig, Peter Michael and Bestle, Dieter}, title = {A Non-Dimensional Quasi-3D Blade Design approach with respect to Aerodynamic Criteria}, series = {Proceedings of the ASME Turbo Expo 2008, presented at the 2008 ASME Turbo Expo, June 9 - 13, 2008, Berlin, Germany, Vol 6., Part C}, booktitle = {Proceedings of the ASME Turbo Expo 2008, presented at the 2008 ASME Turbo Expo, June 9 - 13, 2008, Berlin, Germany, Vol 6., Part C}, publisher = {ASME}, address = {New York, NY}, isbn = {978-0-7918-4316-1}, pages = {2445 -- 2455}, language = {en} } @inproceedings{KeskinSwobodaFlassigetal., author = {Keskin, Akin and Swoboda, Marius and Flassig, Peter Michael and Dutta, Amit Kumar and Bestle, Dieter}, title = {Accelerated Industrial Blade Design Based on Multi-Objective Optimization Using Surrogate Model Methodology}, series = {Proceedings of the ASME Turbo Expo 2008, presented at the 2008 ASME Turbo Expo, June 9 - 13, 2008, Berlin, Germany, Vol 6., Part C}, booktitle = {Proceedings of the ASME Turbo Expo 2008, presented at the 2008 ASME Turbo Expo, June 9 - 13, 2008, Berlin, Germany, Vol 6., Part C}, publisher = {ASME}, address = {New York, NY}, isbn = {978-0-7918-4316-1}, pages = {2339 -- 2349}, language = {en} } @inproceedings{FlassigBestle, author = {Flassig, Peter Michael and Bestle, Dieter}, title = {Robust 2D Compressor Blading with respect to Measured Manufacturing Uncertainties}, language = {en} } @inproceedings{BestleFlassig, author = {Bestle, Dieter and Flassig, Peter Michael}, title = {Optimal Aerodynamic Compressor Blade Design Considering Manufacturing Noise}, language = {en} }