@misc{BuhlKloeppelMertenetal., author = {Buhl, Johannes and Kl{\"o}ppel, Thomas and Merten, Mathias and Haufe, Andre and Israr, Rameez and Bambach, Markus}, title = {Numerical prediction of process-dependent properties of high-performance Ti6Al4 in LS-DYNA}, series = {ESAFORM 2021 : 24th International Conference on Material Forming}, journal = {ESAFORM 2021 : 24th International Conference on Material Forming}, doi = {doi: 10.25518/esaform21.1496}, language = {en} } @misc{KloeppelMertenHaufeetal., author = {Kl{\"o}ppel, Thomas and Merten, Mathias and Haufe, Andre and Buhl, Johannes and Bambach, Markus}, title = {On the Numerical Prediction of Process-Dependent Properties of Current High-Performance Materials with Material Model *MAT_254 in LS-DYNA}, series = {Procedia Manufacturing : 23rd International Conference on Material Forming}, volume = {47}, journal = {Procedia Manufacturing : 23rd International Conference on Material Forming}, editor = {Bambach, Markus}, issn = {2351-9789}, doi = {10.1016/j.promfg.2020.04.341}, pages = {1520 -- 1525}, language = {en} } @misc{GrahmannMertenOstendorfetal., author = {Grahmann, Jan and Merten, Andr{\´e} and Ostendorf, Ralf and Fontenot, M. and Bleh, Daniela and Schenk, Harald and Wagner, Hans-Joachim}, title = {Tunable external cavity quantum cascade lasers (EC-QCL): an application field for MOEMS based scanning gratings}, series = {SPIE Conference: MOEMS and Miniaturized Systems XIII, San Francisco, 2014}, journal = {SPIE Conference: MOEMS and Miniaturized Systems XIII, San Francisco, 2014}, publisher = {SPIE Press}, address = {Bellingham}, isbn = {978-0-8194-9890-8}, pages = {897708-1 -- 897708-11}, language = {en} } @inproceedings{SchenkWagnerGrahmannetal., author = {Schenk, Harald and Wagner, Michael and Grahmann, Jan and Merten, Andr{\´e}}, title = {Advances in MOEMS technologies for high quality imaging systems}, series = {Optical Microlithography XXXI, 27 February-1 March 2018, San Jose, California, Unites States}, booktitle = {Optical Microlithography XXXI, 27 February-1 March 2018, San Jose, California, Unites States}, editor = {Kye, Jongwook and Owa, Soichi}, publisher = {SPIE}, address = {Bellingham, Washington}, isbn = {978-1-5106-1666-0}, doi = {10.1117/12.2297399}, abstract = {An overview of advances in MOEMS devices and technologies for high quality imaging systems is provided. A particular focus is laid on recent technological further developments possibly opening gateways to unprecedented device and system functionality by e. g.: increase of pixel count towards higher parallel operation, decrease of the mirror pitch in large arrays towards applications like high-performance holography, novel technologies for higher operation bandwidth, increase of aperture size for scanning applications like LIDAR, integration of high reflection coatings for processing of multi Watt laser radiation for marking and engraving, and phased arrays for high speed laser beam steering.}, language = {en} }