@misc{CuypersDorpTallaridaetal., author = {Cuypers, Daniel and Dorp, Dennis H. von and Tallarida, Massimo and Brizzi, Simone and Conard, Thierry and Rodriguez, Leonard and Mees, M. and Arnauts, Sophia and Schmeißer, Dieter and Adelmann, Christoph and De Gendt, Stefan}, title = {Study of InP Surfaces after Wet Chemical Treatments}, series = {ECS Journal of Solid State Science and Technology}, volume = {3}, journal = {ECS Journal of Solid State Science and Technology}, number = {1}, issn = {2162-8777}, doi = {10.1149/2.005401jss}, pages = {N3016 -- N3022}, abstract = {The influence of different wet chemical treatments (HCl, H₂SO₄, NH₄OH) on the composition of InP surfaces is studied by using synchrotron radiation photoemission spectroscopy (SRPES). It is shown that a significant amount of oxide remains present after immersion in a NH₄OH solution which is ascribed to the insolubility of In³⁺ at higher pH values. Acidic treatments efficiently remove the native oxide, although components like Pᴼ, Inᴼ and P(2±Δ)+ suboxides are observed. Alternatively, the influence of a passivation step in (NH₄)₂S solution on the surface composition was investigated. The InP surface after immersion into (NH₄)₂S results in fewer surface components, without detection of Pᴼ and P(2±Δ)+ suboxides. Finally, slight etching of InP surfaces in HCl/H₂O₂ solution followed by a native oxide removal step, showed no significant effect on the surface composition.}, language = {en} }