@misc{KolanekHermannDudeketal., author = {Kolanek, Krzysztof and Hermann, Peter and Dudek, Piotr T. and Gotszalk, Teodor and Chumakov, Dmytro and Weisheit, Martin and Hecker, Michael and Zschech, Ehrenfried}, title = {Local anodic oxidation by atomic force microscopy for nano-Raman strain measurements on silicon-germanium thin films}, series = {Thin Solid Films}, volume = {518}, journal = {Thin Solid Films}, number = {12}, issn = {0040-6090}, pages = {3267 -- 3272}, language = {en} } @misc{KolanekTallaridaKaravaevetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Karavaev, Konstantin and Schmeißer, Dieter}, title = {In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope}, language = {en} } @inproceedings{KolanekTallaridaKaravaevetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Karavaev, Konstantin and Schmeißer, Dieter}, title = {In situ measurements of the atomic layer deposition of high-k dielectrics by atomic force microscope for advanced microsystems}, series = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, booktitle = {International Students and Young Scientists Workshop "Photonics and Microsystems", 2009, 25 - 27 June 2009, Harz University, Wernigerode, Germany}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4244-4303-1}, pages = {47 -- 51}, language = {en} } @inproceedings{TallaridaKaravaevKolaneketal., author = {Tallarida, Massimo and Karavaev, Konstantin and Kolanek, Krzysztof and Schmeißer, Dieter}, title = {Nobel "in-situ2" Approach to Modified ALD Processes for Nano-functional Metals Oxide Films}, language = {en} } @misc{TallaridaWeisheitKolaneketal., author = {Tallarida, Massimo and Weisheit, Martin and Kolanek, Krzysztof and Michling, Marcel and Engelmann, Hans-J{\"u}rgen and Schmeißer, Dieter}, title = {Atomic layer deposition of nanolaminate oxide films on Si}, series = {Journal of Nanoparticle Research}, volume = {13}, journal = {Journal of Nanoparticle Research}, number = {11}, doi = {10.1007/s11051-011-0319-x}, pages = {5975 -- 5983}, language = {en} } @misc{KolanekTallaridaSchmeisser, author = {Kolanek, Krzysztof and Tallarida, Massimo and Schmeißer, Dieter}, title = {Atomic layer deposition of HfO2 investigated in situ by means of a noncontact atomic force microscopy}, language = {en} } @inproceedings{BroczkowskaKlocekFriedrichetal., author = {Broczkowska, K. and Klocek, Jolanta and Friedrich, Daniel and Henkel, Karsten and Kolanek, Krzysztof and Urbanowicz, A. and Schmeißer, Dieter and Miller, M. and Zschech, Ehrenfried}, title = {Fullerene based materials for ultra-low-k application}, series = {International Students and Young Scientists Workshop "Photonics and Microsystems", Szklarska, Poreba, Poland, 25 - 27 June 2010}, booktitle = {International Students and Young Scientists Workshop "Photonics and Microsystems", Szklarska, Poreba, Poland, 25 - 27 June 2010}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4244-8324-2}, pages = {39 -- 43}, language = {en} } @misc{KolanekTallaridaMichlingetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Michling, Marcel and Karavaev, Konstantin and Schmeißer, Dieter}, title = {Atomic layer deposition reactor for fabrication of metal oxides}, language = {en} } @misc{KaravaevKolanekTallaridaetal., author = {Karavaev, Konstantin and Kolanek, Krzysztof and Tallarida, Massimo and Schmeißer, Dieter}, title = {In-Situ Studies of ALD Growth of Hafnium Oxide Films}, language = {en} } @misc{KolanekTallaridaMichlingetal., author = {Kolanek, Krzysztof and Tallarida, Massimo and Michling, Marcel and Schmeißer, Dieter}, title = {In situ study of the atomic layer deposition of HfO2 on Si}, series = {Journal of Vacuum Science and Technology}, journal = {Journal of Vacuum Science and Technology}, number = {A 30}, issn = {0734-2101}, pages = {01A143-1 -- 01A143-15}, language = {en} }