@inproceedings{DomaradzkiSchmeisserKaczmareketal., author = {Domaradzki, Jarosław and Schmeißer, Dieter and Kaczmarek, Danuta and Beuckert, Guido and Prociow, E. L. and Borkowska, Angnieszka and Kudrawiec, Robert and Misiewicz, J.}, title = {Characterization of Nanocrystalline TiO2 - HfO2 Thin Films Prepared by Low Pressure Hot Target Reactive Magnetron Sputtering}, language = {en} } @article{DomaradzkiKaczmarekSchmeisseretal., author = {Domaradzki, Jarosław and Kaczmarek, Danuta and Schmeißer, Dieter and Beuckert, Guido}, title = {Microstructure and Optical Properties of TiO2 Thin Films Prepared by Low Pressure Hot Target Reactive Magnetron Sputtering}, language = {en} } @article{SchmeisserDomaradzkiKaczmareketal., author = {Schmeißer, Dieter and Domaradzki, Jarosław and Kaczmarek, Danuta and Borkowska, Angnieszka and M{\"u}ller, Sebastian}, title = {Influence of Annealing on the Structure and Stoichiometry of Europium-Doped Titanium Dioxide Thin Films}, language = {en} } @misc{ObstarczykKaczmarekWojcieszaketal., author = {Obstarczyk, Agata and Kaczmarek, Danuta and Wojcieszak, Damian and Mazur, Michał and Domaradzki, Jarosław and Kotwica, Tomasz and Pastuszek, Roman and Schmeißer, Dieter and Mazur, Piotr and Kot, Małgorzata}, title = {Tailoring optical and electrical properties of thin-film coatings based on mixed Hf and Ti oxides for optoelectronic application}, series = {Materials and Design}, volume = {175}, journal = {Materials and Design}, issn = {0264-1275}, doi = {10.1016/j.matdes.2019.107822}, pages = {15}, abstract = {In this work multi-magnetron sputtering stand was used for the deposition of the mixed oxides thin films based on HfO2 and TiO2. In order to obtain various material composition the power released to each magnetron (containing metallic hafnium and titanium targets) was precisely selected. Structural, surface, optical, electrical and mechanical properties of as-deposited coatings were analyzed. Depending on the hafnium content in the deposited thin films various types of the microstructure was obtained, i.e. HfO2-monoclinic, amorphous and TiO2-rutile. Increase of Ti content above 28 at. \% in the as-prepared mixed oxides coatings caused their amorphization. It was found that with an increase of Ti content in prepared coatings their surface roughness and simultaneously water contact angle decreased. Performed measurements of electrical properties revealed that the lowest leakage current density in the range of 10-7 - 10-8 A/cm2 was obtained for amorphous coatings. Moreover, the tailoring of the dielectric constant was possible by a proper selection of material composition and microstructure of the deposited thin films. Average transparency in the visible wavelength region was in the range of ca. 79-86\%. The influence of material composition and structure on shifting of the fundamental absorption edge and optical bandgap energy was also observed. The refractive index increased with an increase of Ti content, while extinction coefficient was the lowest for amorphous coatings. Additionally, hardness values were dependent on the material composition and optical packing density and were in the range from 7.6 GPa to 10.1 GPa.}, language = {en} }