@article{HoffmannSchmeisserSoinski, author = {Hoffmann, Patrick and Schmeißer, Dieter and Soinski, M. S.}, title = {Promieniowanie synchrotronowe jako uniwersalne narzedzie badawcze - Proby jego wykorzystania w badaniach struktury zeliwa}, language = {de} } @article{Hoffmann, author = {Hoffmann, Patrick}, title = {Oxynitride on 4H-SiC (0001)}, abstract = {It will be reported on the growth of oxynitride ultra-thin layers (<2 nm) on (0 0 0 1)-oriented 4H-SiC surfaces. The oxynitride layers were grown by a thermal treatment of the samples in low pressure (up to 1000 Pa) N2O ambient. By varying the growth conditions (N2O pressure, sample temperature, growth time) different layers were made. The highest nitrogen incorporation was found to be at high temperatures and low N2O pressures.The grown layers were investigated by photoelectron spectroscopy (XPS) for chemical analysis. Concerning the chemical analysis, the general nitrogen content of the samples is compared at different preparation conditions. The films are found to consist mainly of SiO2 and small fraction of silicon nitride. Only a tenth of the nitrogen was incorporated as oxynitride. The results obtained for oxynitride thin films on 4H-SiC are compared to similarly prepared oxynitride layers on Si(1 1 1) investigated in the past. Furthermore, an additional source of nitrogen due to dopand diffusion in the SiC single crystal is reported.}, language = {en} } @article{Hoffmann, author = {Hoffmann, Patrick}, title = {Chemical state depth profiling of ultra-thin oxynitride layers by photoelectron spectroscopy}, language = {en} } @article{Hoffmann, author = {Hoffmann, Patrick}, title = {Oxynitride Grotwth on 4H-SiC(0001) by N2O}, language = {de} } @article{WehnerSchmeisserHoffmann, author = {Wehner, Stefan and Schmeißer, Dieter and Hoffmann, Patrick}, title = {Spatiotemporal patterns of external noise-induced transitions in a bistable reaction-diffusion system : Photoelectron Emission Microscopy experiments and modeling}, language = {en} } @misc{LupinaSchroederDabrowskietal., author = {Lupina, Grzegorz and Schroeder, Thomas and Dabrowski, Jarek Marek and Schmeißer, Dieter and Hoffmann, Patrick}, title = {Praseodymium silicate layers with atomically abrupt interface on Si(100)}, series = {Applied Physics Letters}, volume = {87}, journal = {Applied Physics Letters}, number = {5}, issn = {0003-6951}, pages = {S. 092901}, language = {en} } @misc{HenkelSohalTorcheetal., author = {Henkel, Karsten and Sohal, Rakesh and Torche, Mohamed and Paloumpa, Ioanna and M{\"u}ller, Klaus and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Grenzfl{\"a}chenoptimierung f{\"u}r funktionale D{\"u}nnschichtsysteme: Oxide und Polymere}, series = {Forum der Forschung}, volume = {9}, journal = {Forum der Forschung}, number = {18}, issn = {0947-6989}, pages = {49 -- 56}, language = {de} } @incollection{SchmeisserHoffmannBeuckert, author = {Schmeißer, Dieter and Hoffmann, Patrick and Beuckert, Guido}, title = {Electronic Properties of the Interface Formed by Pr2o3 Growth on Si(001), Si(111)and SiC(0001) Surfaces}, editor = {Zschech, Ehrenfried and Whelan, Caroline}, language = {en} } @misc{HoffmannSchmeisser, author = {Hoffmann, Patrick and Schmeißer, Dieter}, title = {Improvement of Nitrogen Incorporation into Oxynitrides on 4H-SiC(0001)}, series = {Nuclear Instruments and Methods in Physics Research, Section B : Beam with Materials and Atoms}, volume = {246}, journal = {Nuclear Instruments and Methods in Physics Research, Section B : Beam with Materials and Atoms}, number = {1}, pages = {85 -- 89}, language = {en} } @inproceedings{HoffmannSchmeisserEngelmannetal., author = {Hoffmann, Patrick and Schmeißer, Dieter and Engelmann, Hans-J{\"u}rgen and Zschech, Ehrenfried and Stegmann, Heiko and Himpsel, Franz J. and Denlinger, Jonathan D.}, title = {Characterization of chemical bonding in low-k dielectric materials for interconnect isolation: A XAS and EELS Study}, series = {Materials, technology and reliability of low-k dielectrics and copper interconnects, symposium held April 18 - 21, 2006, San Francisco, California}, booktitle = {Materials, technology and reliability of low-k dielectrics and copper interconnects, symposium held April 18 - 21, 2006, San Francisco, California}, editor = {Tsui, Ting Y.}, publisher = {Materials Research Society}, address = {Warrendale, Pa.}, isbn = {978-1-55899-870-5}, pages = {55 -- 62}, language = {en} } @inproceedings{ZschechStegmannSchmeisseretal., author = {Zschech, Ehrenfried and Stegmann, Heiko and Schmeißer, Dieter and Hoffmann, Patrick}, title = {Chemical Bonding, Permittivity, and Elastic Properties in Locally Modified Organosilicate Glass}, language = {en} } @article{HoffmannWehnerSchmeisser, author = {Hoffmann, Patrick and Wehner, Stefan and Schmeißer, Dieter}, title = {Noise-Induced Spatiotemporal Patterns in a Bistable Reaction-Diffusion System: Photoelectron Emission Microscopy experiments and Modeling of the CO Oxidation Reaction on Ir(111)}, language = {en} } @inproceedings{SchmeisserWehnerHoffmannetal., author = {Schmeißer, Dieter and Wehner, Stefan and Hoffmann, Patrick and Brand, Helmut R. and K{\"u}ppers, J{\"u}rgen}, title = {Influence of the Substrate on the Pattern Formation of a Surface Reaction}, series = {Nonequilibrium statistical mechanics and nonlinear physics, XV Conference on Nonequilibrium Statistical Mechanics and Nonlinear Physics, Mar del Plata, Argentina, 4 - 8 December 2006}, booktitle = {Nonequilibrium statistical mechanics and nonlinear physics, XV Conference on Nonequilibrium Statistical Mechanics and Nonlinear Physics, Mar del Plata, Argentina, 4 - 8 December 2006}, editor = {Descalzi, Orazio}, publisher = {AIP Publishing}, address = {Melville, New York}, isbn = {978-0-7354-0421-2}, pages = {121 -- 126}, language = {en} } @article{BeckHoffmannSchmeisseretal., author = {Beck, Romuald B. and Hoffmann, Patrick and Schmeißer, Dieter and Bieniek, Tomasz and Jakubowski, Andrzej}, title = {Composition and Electrical Properties of Ultra-Thin SiOxNy Layers Formed by rf Plasma Nitrogen Implantation/Plasma Oxidation Processes}, language = {en} } @article{MroczynskiHoffmannSchmeisser, author = {Mroczynski, Robert and Hoffmann, Patrick and Schmeißer, Dieter}, title = {The Influence of Annealing (900 Grad C) of Ultra-Thin PECVD Silicon Oxynitride Layers}, language = {en} } @article{BieniekBeckJakubowskietal., author = {Bieniek, Tomasz and Beck, Romuald B. and Jakubowski, Andrzej and Konarski, Piotr and Cwil, M. and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Application of r.f. plasma ultrashallow nitrogen ion implantation for pedestal oxynitride layer formation}, language = {en} } @article{BieniekBeckJakubowskietal., author = {Bieniek, Tomasz and Beck, Romuald B. and Jakubowski, Andrzej and Hoffmann, Patrick and Schmeißer, Dieter and Konarski, Piotr and Cwil, M.}, title = {Formation of Pedestal Oxynitride Layer by Extremely Shallow Nitrogen Implantation in Planar R.F. Plasma Reactor}, language = {en} } @misc{HoffmannWehnerSchmeisseretal., author = {Hoffmann, Patrick and Wehner, Stefan and Schmeißer, Dieter and Brand, Helmut R. and K{\"u}ppers, J{\"u}rgen}, title = {Noise-induced spatiotemporal patterns in a bistable reaction-diffusion system: Photoelectron emission micrsoscopy experiments and modeling of the CO oxidation reaction on Ir(111)}, series = {Physical Review : E}, volume = {73}, journal = {Physical Review : E}, number = {5}, issn = {1550-2376}, pages = {056123}, language = {en} } @inproceedings{HenkelTorcheSohaletal., author = {Henkel, Karsten and Torche, Mohamed and Sohal, Rakesh and Schwiertz, Carola and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Pr-O-N Dielectrics for MIS Stacks on Silicon and Silicon Carbide Surfaces}, series = {Silicon carbide 2006 - materials, processing and devices, symposium held April 18 - 20, 2006, San Francisco, California, U.S.A.}, booktitle = {Silicon carbide 2006 - materials, processing and devices, symposium held April 18 - 20, 2006, San Francisco, California, U.S.A.}, editor = {Dudley, Michael}, publisher = {Materials Research Society}, address = {Warrendale, Pa.}, isbn = {978-1-55899-867-4}, pages = {353 -- 358}, language = {en} } @article{HoffmannMikaloBatcheloretal., author = {Hoffmann, Patrick and Mikalo, Ricardo Pablo and Batchelor, David R. and Schmeißer, Dieter and Soinski, M. S. and Follath, Rolf}, title = {The chromatic aberration of PEEM - demonstration on graphite inclusions in cast iron, Kategrorie: Microscopy - Spectromicroscopy}, language = {en} } @article{GraupnerSeyllerLeyetal., author = {Graupner, R. and Seyller, Th. and Ley, L. and Mikalo, Ricardo Pablo and Hoffmann, Patrick and Batchelor, David R. and Schmeißer, Dieter}, title = {PEEM Investigation of CVD-Diamond grown on Si}, language = {en} } @article{HoffmannMikaloBatcheloretal., author = {Hoffmann, Patrick and Mikalo, Ricardo Pablo and Batchelor, David R. and Schmeißer, Dieter and Follath, Rolf}, title = {N2O-Oxidation of Si(100)}, language = {en} } @article{MikaloHoffmannBatcheloretal., author = {Mikalo, Ricardo Pablo and Hoffmann, Patrick and Batchelor, David R. and Schmeißer, Dieter}, title = {Valence band spectroscopy of semiconducting regioregular Poly(3-Hexylthiophene)-2,5-diyl}, language = {en} }