@inproceedings{HenkelDasSowinskaetal., author = {Henkel, Karsten and Das, Chittaranjan and Sowinska, Małgorzata and Tallarida, Massimo and Schmeißer, Dieter and Gargouri, Hassan and K{\"a}rkk{\"a}nen, Irina and Schneidewind, Jessica and Gruska, Bernd and Arens, Michael}, title = {Charakterisierung von TiO2-ALD-Schichten und deren Nutzung f{\"u}r die Passivierung von Si-Photokathoden}, series = {Tagungsband Photovoltaik-Meeting: Anwendungen-Qualit{\"a}t-Perspektiven, Senftenberg, 15.04.2015}, booktitle = {Tagungsband Photovoltaik-Meeting: Anwendungen-Qualit{\"a}t-Perspektiven, Senftenberg, 15.04.2015}, editor = {Gl{\"u}ck, B. K. and Schmidt, S. and Stein, E. and Raschke, J{\"o}rg-Uwe and Richter, H.}, publisher = {BTU Cottbus-Senftenberg}, address = {Senftenberg}, pages = {3 -- 8}, abstract = {Wir berichten zun{\"a}chst {\"u}ber den Einfluss der Methode der Atomlagenabscheidung auf die TiO2-Schichteigenschaften. Insbesondere wird der Zusammenhang zwischen Ti3+- sowie Interbandzust{\"a}nden mit elektrischen Kennlinien und deren Einfluss auf funktionale Schichteigenschaften diskutiert. Anschließend werden Mikrostrukturierung, Grenzfl{\"a}chen-Engineering und konforme Abscheidung einer TiO2-ALD-Schutzschicht effektiv zur Performance-Steigerung von p-Si-Photokathoden angewendet.}, language = {de} } @inproceedings{TallaridaHenkelGargourietal., author = {Tallarida, Massimo and Henkel, Karsten and Gargouri, Hassan and Haeberle, J{\"o}rg and Gruska, Bernd and Arens, Matthias and Schmeißer, Dieter}, title = {New opportunities with Plasma enhanced atomic layer deposition (PE-ALD) of oxides}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, abstract = {Thermal Atomic layer deposition (T-ALD) of oxides is obtained by the pulsed alternation of a metal precursor and an oxygen source, typically H2O or O3, and the reactions leading to ALD are thermally activated. With plasma enhanced ALD (PE-ALD), instead, the oxygen source is represented by an oxygen-containing plasma. The higher reactivity of the plasma-generated species extend the capabilities of ALD: improved film quality and increased flexibility in process conditions, such as growth at low temperature, are typical advantages of PE-ALD over T-ALD. We report on results on the preparation of thin (<100 nm) aluminum oxide (Al2O3) films on silicon substrates using T-ALD and PE-ALD in the SENTECH SI ALD LL system. Films were deposited in the temperature range between room temperature (RT) and 200∘C. We characterized the films with spectroscopic ellipsometry (thickness, refractive index, growth rate) over 4" wafers and with X-ray photoelectron spectroscopy. All films resulted in a high degree of homogeneity, independent of the deposition temperature. Investigations with capacitance-voltage and conductance-voltage measurements showed a very low interface states density for the PE-ALD films.}, language = {en} } @inproceedings{MandalHenkelSchmeisser, author = {Mandal, Dipankar and Henkel, Karsten and Schmeißer, Dieter}, title = {A polymer nanogenerator based on silver nanoparticles doped electrospun P(VDF-HFP) nanofibers}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, pages = {S. 208}, abstract = {The rising energy demand within the increasing mobility of human society has driven the development of new alternative power sources for portable devices with ultra-low electric power consumption. Based on its piezoelectric properties poly-vinylidene fluoride (PVDF) is a good candidate for mechanical energy harvesting for such devices. Moreover the copolymer poly(vinylidene fluoride-hexafluoropropylene) [P(VDF-HFP)] offers better film flexibility and cost-effectiveness than pure PVDF. We report on a polymer nanogenerator (PNG) based on electrospun P(VDF-HFP) nanofibers doped with silver nanoparticles (Ag-NPs). The electrospun fibers were characterized by FTIR, XPS, SEM and pressure imparting probe. It has been found that the yield of the piezoelectric phase is increased by the addition of Ag-NPs due to an interaction between surface charges of Ag-NPs and the molecular dipoles. Furthermore, defects in the P(VDF-HFP) electrospun fibers are removed. Accordingly, a significant enhancement in the output power of the PNG was found. Similar trends were also observed with Pd-NPs.}, language = {en} } @inproceedings{RouissiHenkelTallaridaetal., author = {Rouissi, Zied and Henkel, Karsten and Tallarida, Massimo and Schmeißer, Dieter}, title = {ALD growth of Al2O3 on Stepped Surface of HOPG and Ag-HOPG}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, pages = {S. 419}, abstract = {Atomic Layer Deposition (ALD) is an excellent deposition technique to grow thin film with high homogeneity coverage on ideal surfaces. Here we are interested in the growth properties on non-ideal (stepped, inert) surfaces. Using STM we studied the growth of Al2O3 by ALD on stepped surface of HOPG and silver covered HOPG (Ag-HOPG). The HOPG sample was cleaved to and then cleaned by N2 in vacuum. We obtain regular steps with terrace widths of 50nm - 500nm. Ag was deposited by thermal deposition on the HOPG. The Al2O3 growth at RT was studies after the first, third, and fifth cycle. Silver evaporation leads to step decoration with island of 1nm-7nm. On the terraces we find the formation of 2D domain of Ag chains. The features caused by the individual ALD cycles of Al2O3 depend on the terrace widths of the HOPG substrate. For small terraces (<100nm) we obtain a growth of 2D domains ( 20nm-25nm) on the edge steps and in the middle of the terrace. For large terraces (>100nm) we find agglomeration of the precursors on individual nucleation sites. Here 3D islands are formed with a height of up to 5nm in the fifth ALD cycle.}, language = {en} } @inproceedings{SohalHenkelMuelleretal., author = {Sohal, Rakesh and Henkel, Karsten and M{\"u}ller, Klaus and Schmeißer, Dieter}, title = {Growth and Characterization of 3C-SiC thin films on Si substrates}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {This work reports on the growth and characterization of cubic silicon carbide thin films. A cold wall low pressure chemical vapour deposition (LPCVD) system has been used to grow the cubic silicon carbide. The two step method, carbonization and subsequent growth, has been used to grow good quality 3C-SiC thin films. The composition and structure of deposited thin films have been analysed by Fourier Transform Infrared Spectroscopy (FTIR), XPS and X-Ray Diffractometry (XRD). The structural quality of the films has been optimized as a function of substrate temperature during carbonization and growth. X-rays diffraction measurements shows that the grown layers are highly oriented crystalline cubic silicon carbide.}, language = {en} } @inproceedings{TorcheMuellerHenkeletal., author = {Torche, Mohamed and M{\"u}ller, Klaus and Henkel, Karsten and Lupina, Grzegorz and Goryako, Andrey and Wollweber, J{\"u}rgen and Schmeißer, Dieter}, title = {Investigations of 3C-SiC growth on Si (001)}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {Carbide was grown on Si (001) - substrates with supply of C2H2. Investigation of the interface Si/SiC (buffer layer) is essential for optimized preparation conditions, leading to a high quality of the growing SiC crystal. In addition to the lattice mismatch of 20 per cent between Si and SiC, which causes defects like dislocations or stacking faults, the chemical homogeneity of this layer is important. XPS was used to characterize the first state of SiC crystal growth on the Si substrate. Carbonizing with C2H2 leads to surface reactions which build up the buffer layer. By using electron spectroscopy, it was possible to characterize the SiC/Si (001) buffer layer, depending on the following reaction parameters: Tsubstrate , PC2H2 , PH2 , the ratio of pressures and the reaction time. The measurements were performed in terms of the content of carbide, oxide and roughness/etching-efficiency (Profilometer) for the reaction parameters above. We found, that the most critical parameter is the temperature of the substrate (Tsubstrate).}, language = {en} } @inproceedings{HenkelPaloumpaMuelleretal., author = {Henkel, Karsten and Paloumpa, Ioanna and M{\"u}ller, Klaus and Schmeißer, Dieter}, title = {P(VDF/TrFE) as a ferroelectric dielectric for Organic Field effect Transistors in MFIS structure}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {MFIS structures consisting of metal, ferroelectric poly[vinylidene fluoride trifluoroethylene](P[VDF/TrFE]), insulator, semiconductor (Si) are fabricated and the influence of the polarization of the P(VDF/TrFE) on the CV characteristics of these structures is investigated. We find a characteristic ferroelectric hysteresis in the CV curves upon increasing the voltage scan window (e.g.-U...U,U=6...30V, |UP(VDF/TrFE)|≤15V, dP(VDF/TrFE)=300 nm). A writing process with adequate electric fields causes large shifts in the flatband voltage ( Δ UFB>4V for the quoted example before) which are stable over days. We report on our investigations which focus on the switching behavior by varying the parameters like polymer thickness, writing field strength and time, long time stability, reversing voltage and insulating material (SiO2, PMMA (Polymethylmetacrylate)). This material combination is favorable for transfer into our full organic concept of field effect transistors for application as a nondestructive readout memory (NDRO) cell.}, language = {en} } @inproceedings{MuellerPaloumpaHenkeletal., author = {M{\"u}ller, Klaus and Paloumpa, Ioanna and Henkel, Karsten and Schmeißer, Dieter}, title = {Organic Field Effect Transistors with polymer high-k dielectric insulator}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {Organic field effect transistors consisting of the copolymer poly(vinylidene fluoridetrifluoroethylene) (P(VDF-TrFE)) and P3HT (poly(3-hexlythiophene)) as active layer have been fabricated. The influence of P(VDF-TrFE) on the transconductance of organic field effect transistors was investigated and enhanced gate effects are observed compared to similar transistors with PMMA (Polymethylmetacrylate) as gate dielectric. Due to the high dielectric constant of P(VDF-TrFE) (DK=12) an operation voltage smaller than for a conventional organic dielectric like PMMA (DK=3.3) was observed. The thickness of the spincoated dielectric layers is in the range of 2microns and in consequence, no significant hysteresis was found, a prerequisite for transistor operation.}, language = {en} } @inproceedings{GarainAdhikaryMandaletal., author = {Garain, Samiran and Adhikary, Prakriti and Mandal, Dipankar and Sen, Shrabanee and Henkel, Karsten and Schmeißer, Dieter}, title = {Electro-active β-Phase Formation in Poly(vinylidene fluoride) Films by Hydrated Rare earth Metal Salt}, series = {Proceeding of the International Conference on Nanotechnology 2013 (ICNT 2013)}, booktitle = {Proceeding of the International Conference on Nanotechnology 2013 (ICNT 2013)}, publisher = {Institute of Technology, Haldia, WB, India}, address = {Haldia}, isbn = {978-81-927756-0-9}, pages = {S. 127}, abstract = {Polyvinylidene fluoride (PVDF) is a typical fluoro-polymer with complicated polymorphisms due to the semi-crystalline nature. Generally, four crystalline phases, α, β, γ and δ may exist in PVDF crystals. The nonpolar α- and δ-phase has a monoclinic lattice with trans-gauche conformation (TGTG⁄), which is thermodynamically most stable for PVDF. The polar β phase with all-trans (TTTT) planar zigzag conformation is attractive for its piezo-, pyro-, and ferroelectric properties. The polar β-Phase and also semi-polar γ-phase (TTTGTTTG⁄) have obtained wide device applications such as acoustic transducers, piezoelectric sensors, energy harvesting generators, pyroelectric sensors, non-volatile memories and energy storage capacitors. In this work, we explore the possibility to nucleate β-phase in PVDF hydrated salt composite films by addition of the hydrated Rare earth metal salt, (NH4)4 Ce (SO4)4, 2H2O) for the piezo- ferro and high dielectric based device applications. It has been found that the water molecules in (NH4)4 Ce (SO4)4, 2H2O could form hydrogen bonds with PVDF during the crystallization process and the hydrogen bonds promoted the electro-active crystalline β- phase in PVDF with all -trans conformations. In addition, the DMF (solvent used for films preparation) can also assist the rare-earth based nanoparticle preparation, as a result the electrostatic interaction of the surface charge of the nanoparticles and molecular dipoles in PVDF can resist the electroactive β- phase in PVDF.}, language = {en} } @inproceedings{SchmeisserMuellerHenkeletal., author = {Schmeißer, Dieter and M{\"u}ller, Sebastian and Henkel, Karsten and M{\"u}ller, Klaus and Wehner, Stefan}, title = {In-situ analysis of moving reaction fronts for the bistable CO oxidation reaction on noble metal catalyst}, series = {Extended Abstracts Book of First International Conference on Materials for Energy}, booktitle = {Extended Abstracts Book of First International Conference on Materials for Energy}, publisher = {Dechema e.V.}, address = {Frankfurt}, isbn = {978-3-89746-117-8}, pages = {S. 932}, abstract = {Experimental data on the reaction kinetics of catalytic processes are prerequisite for modeling of such reactions and their output. We investigate the CO oxidation on some noble metal catalysts, like Iridium(111) and Palladium(111) which is a bistable surface reaction. In a specific range of CO content in the feed gas islands of one or the other adsorbate nucleate and grow, which is recorded with photo electron emission microscopy (PEEM). During these transients the coverage on the surface changes from predominantly oxygen covered to predominantly CO covered resp. vice versa. But the resolution of PEEM and especially its unknown and nonlinear dependence of coverage of the two adsorbates (oxygen and CO) and image intensity make it impossible to extract the changes in coverage. On the other hand the reaction diffusion model based on the Langmuir-Hinshelwood-mechanism delivers the coverage of oxygen and carbon monoxide. The shapeand wall velocity of those islands has been connected perfectly to each other [CPL 423 (2006) 39], but not the absolute coverage and their variation during the reaction. Since the domain wall velocity is small on Iridium(111), this has opened the possibility for a detailed analysis of the changing coverage inside this domain wallutilizing synchrotron radiation and photo electron spectroscopy at BESSY II. The coverage profile of oxygen and CO inside a moving domain wall was measured for both cases using XPS spectra at O1s, C1s and the valence band during thereaction. Comparison with the reaction-diffusion-model and other catalytic surfaces, like Palladium(111) are done.}, language = {en} } @inproceedings{HenkelKotSchmeisser, author = {Henkel, Karsten and Kot, Małgorzata and Schmeißer, Dieter}, title = {Localized defect states and charge trapping in Al₂O₃ films prepared by atomic layer deposition}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, pages = {S. 205}, abstract = {The evaluation of the electronic structure and intrinsic defect mechanisms in Al₂O₃ thin films is essential for their effective use in applications with desired functionality such as surface passivation schemes for solar cells [1]. We present a comparative study of different Al₂O₃ films grown by atomic layer deposition (ALD) [2]. The layers were deposited on different substrates using the same aluminum precursor (TMA, trimethylalumium) and employing different process parameters (thermal-ALD, plasma-enhanced-ALD, substrate temperature). These films were characterized by resonant photoelectron spectroscopy and by electrical measurements (capacitance-voltage). For all films investigated intrinsic defect states within the electronic band gap were observed including excitonic, polaronic, and charge-transfer defect states, where their relative abundance is subject of the choice of ALD parameters and of the used substrate. The spectroscopic assigned in-gap defect states are related with electronic charges as determined in the electrical measurements. [1] G. Dingemans and W.M.M. Kessels, J. Vac. Sci. Technol. A 30, 040802 (2012). [2] K. Henkel, M. Kot, D. Schmeißer, J. Vac. Sci. Technol. A 35, (2017), accepted.}, language = {en} } @inproceedings{GarainHenkelMandaletal., author = {Garain, Samiran and Henkel, Karsten and Mandal, Dipankar and Schmeißer, Dieter}, title = {One-Pot Synthesis of Copper Oxide Nanowires and PVDF/CuO Composite Films for Piezoelectric Energy Harvesting Application}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, pages = {S. 135}, abstract = {Copper oxide (CuO) is an attractive p-type oxide semiconductor with narrow band gap that has intriguing properties such as non-toxicity, chemical stability, electrocatalytic activity, abundant availability and low production cost. Polymeric materials have attracted great interest owing to their high flexibility, light weight, low cost production and high resistance against corrosion. Poly(vinylidene fluoride) (PVDF) is a commonly used piezoelectric polymer due to its excellent flexibility and piezoelectric properties. In this work, we adopted a one-pot synthesis of CuO nanowires by facile and selective chemical etching process of Cu substrate. XPS, XRD, SEM data ascribed the formation of polycrystalline CuO nanowires over the entire Cu surface. It has been observed that the uniformity, shape and size of the nanowires could be conveniently controlled by etching time and etchant concentration. We have also prepared piezoelectric nanogenerator based on the flexible PVDF/CuO composite film, where the traditional electrical poling treatment was avoided. In addition, dielectric properties have been studied to demonstrate the role of interfacial polarization.}, language = {en} } @inproceedings{KotNaumannGarainetal., author = {Kot, Małgorzata and Naumann, Franziska and Garain, Samiran and Po{\'{z}}arowska, Emilia and Gargouri, Hassan and Henkel, Karsten and Schmeißer, Dieter}, title = {Aluminum nitride films prepared by plasma atomic layer deposition using different plasma sources}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Band 53,3}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, pages = {S. 170}, abstract = {Aluminum nitride (AlN) thin films are promising for versatile applications in optoelectronics, electronics, piezoelectrics, and acoustics due to their remarkable properties such as wide band gap, high dielectric constant, low electrical conductivity, good piezoelectric coefficient and high ultrasonic velocity. We present a comparative study of AlN films grown by plasma-enhanced atomic layer deposition at 350°C silicon wafers in the SENTECH SI ALD LL system using TMA and NH3 where either a capacitively coupled plasma (CCP) or a direct PTSA (planar triple spiral antenna) source was applied. The films were characterized by ellipsometry, XPS and electrical measurements. The layer properties are discussed concerning the varied ALD process parameters. In general, the process using the direct PTSA source delivered films with higher refractive index and better homogeneity over the wafer achieving also higher growth rates per cycle (GPC) in reduced total cycle durations. Films with refractive index in the range of 2.05 and permittivity around 8 could be realized with a GPC of 1.54 {\AA}/cycle.}, language = {en} }