@misc{HaeberleHenkelGargourietal., author = {Haeberle, J{\"o}rg and Henkel, Karsten and Gargouri, Hassan and Naumann, Franziska and Gruska, Bernd and Arens, Michael and Tallarida, Massimo and Schmeißer, Dieter}, title = {Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films}, series = {Beilstein Journal of Nanotechnology}, volume = {2013}, journal = {Beilstein Journal of Nanotechnology}, number = {4}, issn = {2190-4286}, doi = {10.3762/bjnano.4.83}, pages = {732 -- 742}, abstract = {We report on results on the preparation of thin (<100 nm) aluminum oxide (Al2O3) films on silicon substrates using thermal atomic layer deposition (T-ALD) and plasma enhanced atomic layer deposition (PE-ALD) in the SENTECH SI ALD LL system. The T-ALD Al2O3layers were deposited at 200 °C, for the PE-ALD films we varied the substrate temperature range between room temperature (rt) and 200 °C. We show data from spectroscopic ellipsometry (thickness, refractive index, growth rate) over 4" wafers and correlatethem to X-ray photoelectron spectroscopy (XPS) results. The 200°C T-ALD and PE-ALD processes yield films with similar refractive indices and with oxygen to aluminum elemental ratios very close to the stoichiometric value of 1.5. However, in both also fragments of the precursor are integrated into the film. The PE-ALD films show an increased growth rate and lower carbon contaminations. Reducing the deposition temperature down to rt leads to a higher content of carbon and CH-species. We also find a decrease of the refractive index and of the oxygen to aluminum elemental ratio as well as an increase of the growth rate whereas the homogeneity of the film growth is not influenced significantly. Initial state energy shifts in all PE-ALD samples are observed which we attribute to a net negative charge within the films.}, language = {en} } @inproceedings{HaeberleRichterSchmeisseretal., author = {Haeberle, J{\"o}rg and Richter, Matthias and Schmeißer, Dieter and Galazka, Zbigniew and Janowitz, Christoph}, title = {Resonant Photoemission at the O1s threshold to characterize In2O3 single crystals}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, abstract = {We report on spectroscopic investigations on In2O3 single crystals. We focus on the detailed analysis of the O1s resonance profile by resonant photoelectron spectroscopy (resPES). From these we analyze the electronic structure and assign the O2p- and In5sp state to build the valence band and the conduction band in different contributions, respectively. This is deduced from constant final state spectra on the O-KLL-Auger along the O K-edge and In M4,5-edge and a comparison to the corresponding X-ray absorption spectroscopy data. We also identify several types of defects. A broad band of oxygen derived defects is identified in the valence band and extends throughout the gap. Small polarons are attributed to cause an anti-resonance in the constant initial states around the O1s threshold. In addition, an Auger decay separated by the O-KLL is present at O-K resonance and indicates the existence of localized charge transfer states which involves In5sp states. Finally, we are able to distinguish two different oxygen species from the resPES data. One corresponds to theintrinsic In2O3 structure and the other is a non-corresponding species.}, language = {en} }