@inproceedings{GehrlichOhsiekKleinetal., author = {Gehrlich, Lukas and Ohsiek, Susanne and Klein, M. and Geiss, M. and Friedemann, Michael and K{\"u}cher, Peter and Schmeißer, Dieter}, title = {Ultrathin TaN/Ta barrier modifications to fullfill next technology node requirements}, series = {2011 IEEE International Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM 2011), Dresden, Germany, 8 - 12 May 2011}, booktitle = {2011 IEEE International Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM 2011), Dresden, Germany, 8 - 12 May 2011}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4577-0503-8}, doi = {10.1109/IITC.2011.5940322}, pages = {82 -- 84}, language = {en} } @misc{GerlichOhsiekKleinetal., author = {Gerlich, Lukas and Ohsiek, Susanne and Klein, Christoph and Geiß, Mario and Friedemann, Michael and K{\"u}cher, Peter and Schmeißer, Dieter}, title = {Interface engineering for the TaN/Ta barrier film deposition process to control Ta-crystal growth}, series = {Microelectronic Engineering}, volume = {Vol. 106}, journal = {Microelectronic Engineering}, doi = {10.1016/j.mee.2013.01.017}, pages = {63 -- 68}, abstract = {As a consequence of device shrinking the resistivity of the widely used TaN/Ta double barrier layer becomes an increasingly important parameter for device speed beyond the 32 nm technology node. In this study we describe the optimization of the deposition of TaN/Ta stacks in such a way that tantalum nitride layer thickness is minimized and tantalum grows in the favorable conducting alpha-phase. In the first part of the study we usedin situ ARXPS to investigate the growth of different tantalum nitride layers on SiO2 and SiOCH as a function of deposition time, nitrogen flow and deposition power. In the second part we analyzed the crystalline phase of a 20 nm thick tantalum layer deposited on top of the same series of tantalum nitride layers characterized in the growth study. The main findings are the appearance of tan-talum carbide and tantalum silicide as interface species for the deposition on SiOCH and only tantalum silicide for the deposition on SiO2. We found that alpha-tantalum grows preferably on tantalum carbide and nitrogen rich intermediate layers whereas silicide at the interface promotes the growth of beta-tantalum. To verify these findings we studied two additional modifications of the interface. A lower bias power for a deposition of tantalum nitride on SiO2 was used to confirm the role of tantalum silicide and a thermal treatment of a thin tantalum layer on SiOCH was applied to confirm the role of tantalum carbide. Finally, the contact resistance in via chains on patterned wafers for four selected processes showed the same trends as the sheet resistance of the corresponding barrier films on blanket wafer experiments.}, language = {en} } @misc{BreussKemmVogel, author = {Breuß, Michael and Kemm, Friedemann and Vogel, Oliver}, title = {A numerical study of Newton interpolation with extremely high degrees}, series = {Kybernetika : international journal published by Institute of Information Theory and Automation}, volume = {54}, journal = {Kybernetika : international journal published by Institute of Information Theory and Automation}, number = {2}, issn = {0023-5954}, doi = {10.14736/kyb-2018-2-0279}, pages = {279 -- 288}, abstract = {In current textbooks the use of Chebyshev nodes with Newton interpolation is advocated as the most efficient numerical interpolation method in terms of approximation accuracy and computational effort. However, we show numerically that the approximation quality obtained by Newton interpolation with Fast Leja (FL) points is competitive to the use of Chebyshev nodes, even for extremely high degree interpolation. This is an experimental account of the analytic result that the limit distribution of FL points and Chebyshev nodes is the same when letting the number of points go to infinity. Since the FL construction is easy to perform and allows to add interpolation nodes on the fly in contrast to the use of Chebyshev nodes, our study suggests that Newton interpolation with FL points is currently the most efficient numerical technique for polynomial interpolation. Moreover, we give numerical evidence that any reasonable function can be approximated up to machine accuracy by Newton interpolation with FL points if desired, which shows the potential of this method.}, language = {en} }