@inproceedings{HeimFriedrichGuttmannetal., author = {Heim, S. and Friedrich, Daniel and Guttmann, P. and Rehbein, S. and Chumakov, Dmytro and Ritz, Y. and Schneider, G. and Schmeißer, Dieter and Zschech, Ehrenfried}, title = {Dynamical X-ray Microscopy Study of Stress-Induced Voiding in Cu Interconnects}, language = {en} } @inproceedings{FriedrichMichlingKloceketal., author = {Friedrich, Daniel and Michling, Marcel and Klocek, Jolanta and Schmeißer, Dieter and Avdoshenko, Stas and Chumakov, Dmytro and Zschech, Ehrenfried}, title = {Study of C60 based films formation by NEXAFS}, series = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 44}, booktitle = {Verhandlungen der Deutschen Physikalischen Gesellschaft, Reihe 6, Bd. 44}, publisher = {Deutsche Physikalische Gesellschaft}, address = {Bad Honnef}, issn = {0420-0195}, pages = {S. 145}, abstract = {The C60 fullerenes and some of its -OH, -CF3 and -Cl derivates are candidates for application as ultra-low-k insulators in the semiconductor industry. Future preparation of thin films based on these materials requires the stability of the substituted fullerenes against chemical handling and processing steps. The latter issue was addressed by our NEXAFS studies that were done by synchrotron radiation at the beam line U49/2-PGM2 at BESSY II. Performed were the C K-edge NEXAFS studies in total fluorescence and total electron yield modes. The C60 based films were deposited on silicon by spraying from solutions. The influence of the different substitutional groups with C60 molecules was studied. The data were compared to the reference spectra of a pure C60 film. For C60(OH)24, C60-Cl2 and C60(CF3)12 a variance of the intensity of the π*-resonance as well as shift to higher energies of 0.5 eV (-OH), 0.6 eV (-F), 0.7 eV (-Cl) were observed. The results confirm the necessary stability of the used C60 derivatives and shall be used for optimization of the film deposition chemistry and conditions.}, language = {en} } @misc{SchmeisserTallaridaHenkeletal., author = {Schmeißer, Dieter and Tallarida, Massimo and Henkel, Karsten and M{\"u}ller, Klaus and Mandal, Dipankar and Chumakov, Dmytro and Zschech, Ehrenfried}, title = {Characterization of oxidic and organic materials with synchrotron radiation based XPS and XAS}, language = {en} } @misc{ZagorodniyChumakovTaeschneretal., author = {Zagorodniy, Kostyantyn and Chumakov, Dmytro and T{\"a}schner, Christine and Lukowiak, Anna and Stegmann, Heiko and Schmeißer, Dieter and Geisler, Holm and Engelmann, Hans-J{\"u}rgen and Hermann, Helmut and Zschech, Ehrenfried}, title = {Novel Carbon-cage based ultralow-k materials: Modelling and first experiments}, doi = {10.1109/TSM.2008.2005396}, language = {en} } @misc{KolanekHermannDudeketal., author = {Kolanek, Krzysztof and Hermann, Peter and Dudek, Piotr T. and Gotszalk, Teodor and Chumakov, Dmytro and Weisheit, Martin and Hecker, Michael and Zschech, Ehrenfried}, title = {Local anodic oxidation by atomic force microscopy for nano-Raman strain measurements on silicon-germanium thin films}, series = {Thin Solid Films}, volume = {518}, journal = {Thin Solid Films}, number = {12}, issn = {0040-6090}, pages = {3267 -- 3272}, language = {en} }