@book{SpechtForkelWeberetal., author = {Specht, Dieter and Forkel, M. and Weber, H. and Specht, Dieter}, title = {Fokus - Forschungskapazit{\"a}ten und -seviceleistungen}, publisher = {Berlin; Heidelberg u. a. : Springer}, language = {en} } @inproceedings{MaiDauderstaedtPahneretal., author = {Mai, Andreas and Dauderst{\"a}dt, Ulrike and Pahner, D. and Krellmann, M. and Schmeißer, Dieter and Wagner, M.}, title = {In situ determination of laser induced degradation of micro-mirror arrays}, series = {International Students and Young Scientists Workshop Photonics and Microsystems, Cottbus, Germany, 8 - 10 June 2011}, booktitle = {International Students and Young Scientists Workshop Photonics and Microsystems, Cottbus, Germany, 8 - 10 June 2011}, publisher = {IEEE}, address = {Piscataway, NJ}, isbn = {978-1-4577-1651-5}, doi = {10.1109/STYSW.2011.6155850}, pages = {84 -- 88}, abstract = {The Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS) develops spatial light modulators (SLMs) based on arrays of tiltable micro mirrors on a semiconductor chip. Typical applications are pattern generation for deepUV-laser mask writing or structured illumination in microscopy. Development and optimization of such SLMs requires detailed knowledge of the device behaviour under operating conditions. Here, the flatness of each single mirror effects the image resolution and contrast of the generated pattern and is amongst others a characteristic property of SLMs. In this context a surface topography measurement under laser exposure (in situ) was designed. The interferometric setup uses the phase-shift principle and allows a resolution in z-direction in the single-digit nanometer range. During irradiation with UV-laser light at 248 nm (KrF) and energy densities of up to 20 mJ/cm2 the change in single micro-mirrors topography was detected in situ. Measurementswith varying pulse energies were carried out to identify an impacton the device performance. In general, the setup is neither limited to a specific illumination wavelength nor to micro-mirrors as structures under test.}, language = {en} } @techreport{MuellerDieterBauhusetal., author = {M{\"u}ller, J{\"o}rg and Dieter, M. and Bauhus, J. and Spellmann, H. and M{\"o}hring, B. and Wagner, S. and Wolf, Heino and Niekisch, M. and Weiger, H. and Feindt, Peter H. and Hamm, Ulrich and W{\"a}tzold, Frank and Wolters, Volkmar and Engels, Eve-Marie and Schraml, U. and Lang, F. and Pr{\"o}bstl-Haider, U. and Richter, K.}, title = {Wege zu einem effizienten Waldnaturschutz in Deutschland. Stellungnahme}, publisher = {Wissenschaftlicher Beirat Waldpolitik und Wissenschaftlicher Beirat Biodiversit{\"a}t und Genetische Ressourcen beim BMEL}, pages = {62}, language = {de} } @article{WieprechtStielerHeinzeetal., author = {Wieprecht, Wolfgang and Stieler, M. and Heinze, G. and M{\"o}ller, Detlev and Riebel, Ulrich and Hofmann, E. and Sparmann, A. and Kalaß, Dieter and Acker, Karin and Auel, Renate}, title = {Droplet concentrations (LWC) and its chemical composition after gas cleaning in the lignite firwed power plant J{\"a}nschwalde (FRG)}, language = {en} } @book{SpechtForkelWeber, author = {Specht, Dieter and Forkel, M. and Weber, H.}, title = {Semantic Modelling of Technical Objects}, publisher = {Berlin; Heidelberg u. a. : Springer}, isbn = {3540977546}, language = {en} } @article{SeyllerSieberGraupneretal., author = {Seyller, Th. and Sieber, N. and Graupner, R. and James, D. and Riley, J. and Leckey, R. and Polcik, M. and Schmeißer, Dieter}, title = {High Resolution Photoelectron Spectroscopy on SiC Surfaces}, language = {en} } @misc{LewerenzAggourMurrelletal., author = {Lewerenz, Hans-Joachim and Aggour, Mohammed and Murrell, Chris and Kanis, M. and Hoffmann, Patrick and Jungblut, H. and Schmeißer, Dieter}, title = {Interface engineering of photoelectrochemically prepared Si surfaces}, abstract = {The oxide of Si(111) formed by electropolishing in dilute ammonium fluoride solution is analysed by photoelectron spectroscopy using synchrotron radiation. The oxidiclayer is about 3.1 nm thick and contains Si-F-x species as well as oxyfluorides. The oxyfluorides are found preferentially at the electropolishing layer surface. SiOHspecies are concentrated at the oxidic film/substrate interface. The full width half maximum of the Si 2p line indicates that the Si/electropolishing oxide interface issmoother than the Si/natural oxide interface.}, language = {en} } @inproceedings{MoellerWieprechtHofmeisteretal., author = {M{\"o}ller, Detlev and Wieprecht, Wolfgang and Hofmeister, J. and Kalaß, Dieter and Elbing, F. and Ulbricht, M.}, title = {Fog dissipation by dry ice blasting process mechanism}, series = {Proceedings, 2nd International Conference on Fog and Fog Collection, St. John's, Canada, July 15 - 20, 2001}, booktitle = {Proceedings, 2nd International Conference on Fog and Fog Collection, St. John's, Canada, July 15 - 20, 2001}, address = {North York}, isbn = {0-9683887-1-X}, pages = {485 -- 491}, language = {en} } @misc{LewerenzAggourMurrelletal., author = {Lewerenz, Hans-Joachim and Aggour, Mohammed and Murrell, Chris and Kanis, M. and Jungblut, H. and Jakubowicz, J. and Cox, P. A. and Campbell, S. A. and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Initial stages of structure formation on silicon electrodes investigated by photoelectron spectroscopy using synchrotron radiation and in-situ atomic force microscopy}, series = {Journal of the Electrochemical Society}, volume = {150}, journal = {Journal of the Electrochemical Society}, number = {3}, issn = {1945-7111}, pages = {E185 -- E189}, abstract = {The surface condition of electrochemically H-terminated Si is compared with the situation at the first photocurrent maximum in dilute acidic ammonium fluoride solution where the divalent dissolution converts into the four-valence process. The first high spectral-resolution photoelectron spectroscopy data using synchrotron radiation of electrochemically hydrogenated Si are presented. A combined electrochemistry/ultrahigh vacuum surface analysis system, attached to the U 49/2 beamline at the synchrotron Bessy II, is used for photoelectron spectroscopy (PES) of the electrochemically conditioned samples. We analyze the Si 2p, O 1s, and F 1s core levels. A comparison of a density functional theory calculation of the reaction sequence, proposed in the dissolution model of Gerischer and co-workers, with the PES results supports this model. The anodized sample is characterized by a residual H coverage of 0.35 monolayers evidenced by a surface core level shift, Si-OH and Si-Fx species, F-, and a higher oxidized Si species. SiO2 is not found. Even on very well H-terminated surfaces, we find residual Si-OH complexes, fluoride and water. In situ atomic force microscopy shows a roughening with a root mean square roughness parameter of 2.6 nm. \%A92003 The Electrochemical Society. All rights reserved.}, language = {en} } @misc{LewerenzMurrellJakubowiczetal., author = {Lewerenz, Hans-Joachim and Murrell, Chris and Jakubowicz, J. and Aggour, Mohammed and Kanis, M. and Campbell, S. A. and Cox, P. A. and Hoffmann, Patrick and Jungblut, H. and Schmeißer, Dieter}, title = {High Resolution Surface analysis of Si Roughenning in Dilute Ammonium Fluoride Solution}, series = {Journal of Electroanalytical Chemistry}, volume = {540}, journal = {Journal of Electroanalytical Chemistry}, issn = {1873-2569}, pages = {3 -- 6}, abstract = {The initial stages of porous Si formation on Si(111) in dilute ammonium fluoride solution are analysed by photoelectron spectroscopy using synchrotron radiation (SRPES). The PES results in the por-Si formation regime partly support a recent dissolution model. The contribution from the Si 2p surface core level shift shows that 0.35 ML of the surface is still H-terminated after interruption of the conditioning process at the first photocurrent maximum. Two signals shifted in binding energy by 0.8 and 1 eV, respectively, are attributed to reaction intermediates expected from the proposed reaction mechanism and from theoretical calculations using density functional theory (DFT). A distinct roughening is found in in-situ AFM measurements, with a calculated RMS roughness parameter of 2.6 nm.}, language = {en} } @article{HoffmannSchmeisserSoinski, author = {Hoffmann, Patrick and Schmeißer, Dieter and Soinski, M. S.}, title = {Promieniowanie synchrotronowe jako uniwersalne narzedzie badawcze - Proby jego wykorzystania w badaniach struktury zeliwa}, language = {de} } @incollection{HenkelSchwiertzWagneretal., author = {Henkel, Karsten and Schwiertz, Carola and Wagner, S. and Valdeig, A. and List, M. and Schmeißer, Dieter}, title = {Partikel- und Tropfendetektion im Mikrometerbereich mittels Schwingquarzen}, publisher = {w.e.b.-Univ.-Verl.}, address = {Dresden}, isbn = {3-935712-92-8}, pages = {291 -- 294}, language = {de} } @article{SpechtGruss, author = {Specht, Dieter and Gruß, Christian M. F.}, title = {Revenue Management - sind Ertragssteigerungen auch f{\"u}r produzierende Unternehmen m{\"o}glich?}, language = {de} } @article{SpechtGruss, author = {Specht, Dieter and Gruß, Christian M. F.}, title = {Kontingentierungsans{\"a}tze des Revenue Managements f{\"u}r produzierende Unternehmen}, language = {de} } @book{SpechtGruss, author = {Specht, Dieter and Gruß, Christian M. F.}, title = {Model{\"u}berblick zur optimalen Auftragsannahmeentscheidung f{\"u}r produzierende Unternehmen auf Basis des Revenue Management Ansatzes}, publisher = {M{\"u}nchen, TCW}, isbn = {978-3-937236-62-7}, language = {de} } @book{SpechtGruss, author = {Specht, Dieter and Gruß, Christian M. F.}, title = {Revenue Management - eine Strategie f{\"u}r die Produktion in der Automobilindustrie?}, publisher = {Deutscher Universit{\"a}ts-Verlag}, address = {Wiesbaden}, isbn = {978-3-8350-0932-5}, language = {de} } @article{SpechtGrussStefanska, author = {Specht, Dieter and Gruß, Christian M. F. and Stefanska, Renata}, title = {Erweiterte Zeiterfassungsmethodik zur Schwachstellenidentifikation im Prozessablauf}, language = {de} } @article{SpechtStefanskaGruss, author = {Specht, Dieter and Stefanska, Renata and Gruß, Christian M. F.}, title = {Objektorientierter Ansatz zur Kostenbeeinflussung in den Fr{\"u}hphasen der Produktentstehung}, language = {de} } @article{BieniekBeckJakubowskietal., author = {Bieniek, Tomasz and Beck, Romuald B. and Jakubowski, Andrzej and Konarski, Piotr and Cwil, M. and Hoffmann, Patrick and Schmeißer, Dieter}, title = {Application of r.f. plasma ultrashallow nitrogen ion implantation for pedestal oxynitride layer formation}, language = {en} } @misc{SchwarzkopfDirsyteDevietal., author = {Schwarzkopf, Jutta and Dirsyte, R. and Devi, A. and Kwasniewski, A. and Schmidbauer, M. and Wagner, Gerd and Michling, Marcel and Schmeißer, Dieter and Fornari, Robert}, title = {Influence of Na on the structure of Bi4Ti3O12 films deposited by liquid-delivery spin MOCVD}, series = {Thin solid films}, volume = {519}, journal = {Thin solid films}, number = {17}, issn = {0040-6090}, pages = {5754 -- 5759}, language = {en} }