@misc{PerezPerezAvilaRomeroZalizetal., author = {P{\´e}rez, Eduardo and P{\´e}rez-{\´A}vila, Antonio Javier and Romero-Zaliz, Roc{\´i}o and Mahadevaiah, Mamathamba Kalishettyhalli and P{\´e}rez-Bosch Quesada, Emilio and Roldan, Juan Bautista and Jim{\´e}nez-Molinos, Francisco and Wenger, Christian}, title = {Optimization of Multi-Level Operation in RRAM Arrays for In-Memory Computing}, series = {Electronics (MDPI)}, volume = {10}, journal = {Electronics (MDPI)}, number = {9}, issn = {2079-9292}, doi = {10.3390/electronics10091084}, pages = {15}, abstract = {Accomplishing multi-level programming in resistive random access memory (RRAM) arrays with truly discrete and linearly spaced conductive levels is crucial in order to implement synaptic weights in hardware-based neuromorphic systems. In this paper, we implemented this feature on 4-kbit 1T1R RRAM arrays by tuning the programming parameters of the multi-level incremental step pulse with verify algorithm (M-ISPVA). The optimized set of parameters was assessed by comparing its results with a non-optimized one. The optimized set of parameters proved to be an effective way to define non-overlapped conductive levels due to the strong reduction of the device-to-device variability as well as of the cycle-to-cycle variability, assessed by inter-levels switching tests and during 1k reset-set cycles. In order to evaluate this improvement in real scenarios, the experimental characteristics of the RRAM devices were captured by means of a behavioral model, which was used to simulate two different neuromorphic systems: an 8×8 vector-matrixmultiplication (VMM) accelerator and a 4-layer feedforward neural network for MNIST database recognition. The results clearly showed that the optimization of the programming parameters improved both the precision of VMM results as well as the recognition accuracy of the neural network in about 6\% compared with the use of non-optimized parameters.}, language = {en} } @misc{MiloAnzaloneZambellietal., author = {Milo, Valerio and Anzalone, Francesco and Zambelli, Cristian and P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Ossorio, {\´O}scar G. and Olivo, Piero and Wenger, Christian and Ielmini, Daniele}, title = {Optimized programming algorithms for multilevel RRAM in hardware neural networks}, series = {IEEE International Reliability Physics Symposium (IRPS), 2021}, journal = {IEEE International Reliability Physics Symposium (IRPS), 2021}, isbn = {978-1-7281-6894-4}, issn = {1938-1891}, doi = {10.1109/IRPS46558.2021.9405119}, abstract = {A key requirement for RRAM in neural network accelerators with a large number of synaptic parameters is the multilevel programming. This is hindered by resistance imprecision due to cycle-to-cycle and device-to-device variations. Here, we compare two multilevel programming algorithms to minimize resistance variations in a 4-kbit array of HfO 2 RRAM. We show that gate-based algorithms have the highest reliability. The optimized scheme is used to implement a neural network with 9-level weights, achieving 91.5\% (vs. software 93.27\%) in MNIST recognition.}, language = {en} } @misc{PetrykDykaPerezetal., author = {Petryk, Dmytro and Dyka, Zoya and P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Kabin, Ievgen and Wenger, Christian and Langend{\"o}rfer, Peter}, title = {Evaluation of the Sensitivity of RRAM Cells to Optical Fault Injection Attacks}, series = {EUROMICRO Conference on Digital System Design (DSD 2020), Special Session: Architecture and Hardware for Security Applications (AHSA)}, journal = {EUROMICRO Conference on Digital System Design (DSD 2020), Special Session: Architecture and Hardware for Security Applications (AHSA)}, isbn = {978-1-7281-9535-3}, issn = {978-1-7281-9536-0}, doi = {10.1109/DSD51259.2020.00047}, pages = {8}, language = {en} } @misc{RomeroZalizPerezJimenezMolinosetal., author = {Romero-Zaliz, Roc{\´i}o and P{\´e}rez, Eduardo and Jimenez-Molinos, Francisco and Wenger, Christian and Roldan, Juan Bautista}, title = {Influence of variability on the performance of HfO2 memristor-based convolutional neural networks}, series = {Solid State Electronics}, volume = {185}, journal = {Solid State Electronics}, issn = {0038-1101}, doi = {10.1016/j.sse.2021.108064}, pages = {5}, abstract = {A study of convolutional neural networks (CNNs) was performed to analyze the influence of quantization and variability in the network synaptic weights. Different CNNs were considered accounting for the number of convolutional layers, size of the filters in the convolutional layer, number of neurons in the final network layers and different sets of quantization levels. The conductance levels of fabricated 1T1R structures based on HfO2 memristors were considered as reference for four or eight level quantization processes at the inference stage of the CNNs, which were previous trained with the MNIST dataset. We also included the variability of the experimental conductance levels that was found to be Gaussian distributed and was correspondingly modeled for the synaptic weight implementation.}, language = {en} } @misc{PerezMahadevaiahPerezBoschQuesadaetal., author = {P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Perez-Bosch Quesada, Emilio and Wenger, Christian}, title = {Variability and Energy Consumption Tradeoffs in Multilevel Programming of RRAM Arrays}, series = {IEEE Transactions on Electron Devices}, volume = {68}, journal = {IEEE Transactions on Electron Devices}, number = {6}, issn = {0018-9383}, doi = {10.1109/TED.2021.3072868}, pages = {2693 -- 2698}, abstract = {Achieving a reliable multi-level programming operation in resistive random access memory (RRAM) arrays is still a challenging task. In this work, we assessed the impact of the voltage step value used by the programming algorithm on the device-to-device (DTD) variability of the current distributions of four conductive levels and on the energy consumption featured by programming 4-kbit HfO2-based RRAM arrays. Two different write-verify algorithms were considered and compared, namely, the incremental gate voltage with verify algorithm (IGVVA) and the incremental step pulse with verify algorithm (ISPVA). By using the IGVVA, a main trade-off has to be taken into account since reducing the voltage step leads to a smaller DTD variability at the cost of a strong increase in the energy consumption. Although the ISPVA can not reduce the DTD variability as much as the IGVVA, its voltage step can be decreased in order to reduce the energy consumption with almost no impact on the DTD variability. Therefore, the final decision on which algorithm to employ should be based on the specific application targeted for the RRAM array.}, language = {en} } @misc{OssorioVinuesaGarciaetal., author = {Ossorio, {\´O}scar G. and Vinuesa, Guillermo and Garcia, Hector and Sahelices, Benjamin and Due{\~n}as, Salvador and Cast{\´a}n, Helena and P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Wenger, Christian}, title = {Performance Assessment of Amorphous HfO2-based RRAM Devices for Neuromorphic Applications}, series = {ECS Transactions}, volume = {102}, journal = {ECS Transactions}, number = {2}, issn = {1938-6737}, doi = {10.1149/10202.0029ecst}, pages = {29 -- 35}, abstract = {The use of thin layers of amorphous hafnium oxide has been shown to be suitable for the manufacture of Resistive Random-Access memories (RRAM). These memories are of great interest because of their simple structure and non-volatile character. They are particularly appealing as they are good candidates for substituting flash memories. In this work, the performance of the MIM structure that takes part of a 4 kbit memory array based on 1-transistor-1-resistance (1T1R) cells was studied in terms of control of intermediate states and cycle durability. DC and small signal experiments were carried out in order to fully characterize the devices, which presented excellent multilevel capabilities and resistive-switching behavior.}, language = {en} } @misc{MahmoodinezhadMoralesNaumannetal., author = {Mahmoodinezhad, Ali and Morales, Carlos and Naumann, Franziska and Plate, Paul and Meyer, Robert and Janowitz, Christoph and Henkel, Karsten and Kot, Małgorzata and Z{\"o}llner, Marvin Hartwig and Wenger, Christian and Flege, Jan Ingo}, title = {Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma}, series = {Journal of Vacuum Science and Technology A}, volume = {39}, journal = {Journal of Vacuum Science and Technology A}, number = {6}, issn = {0734-2101}, doi = {10.1116/6.0001375}, abstract = {Indium oxide (InxOy) thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) using trimethylindium and oxygen plasma in a low-temperature range of 80-200 °C. The optical properties, chemical composition, crystallographic structure, and electrical characteristics of these layers were investigated by spectroscopic ellipsometry (SE), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), as well as current-voltage and capacitance-voltage measurements. The SE results yielded a nearly constant growth rate of 0.56 {\AA} per cycle and a thickness inhomogeneity of ≤1.2\% across 4-in. substrates in the temperature range of 100-150 °C. The refractive index (at 632.8 nm) was found to be 2.07 for the films deposited at 150 °C. The PEALD-InxOy layers exhibit a direct (3.3 ± 0.2 eV) and an indirect (2.8 ± 0.1 eV) bandgap with an uptrend for both with increasing substrate temperature. Based on XPS characterization, all InxOy samples are free of carbon impurities and show a temperature-dependent off-stoichiometry indicating oxygen vacancies. XRD diffraction patterns demonstrate an onset of crystallization at 150 °C. Consistent with the optical, XPS, and XRD data, the films deposited at ≥150 °C possess higher electrical conductivity. Our findings prove that a low-temperature PEALD process of InxOy is feasible and promising for a high-quality thin-film deposition without chemical impurities on thermally fragile substrates.}, language = {en} } @misc{YunLeeKimetal., author = {Yun, Min Ju and Lee, Doowon and Kim, Sungho and Wenger, Christian and Kim, Hee-Dong}, title = {A nonlinear resistive switching behaviors of Ni/HfO2/TiN memory structures for self-rectifying resistive switching memory}, series = {Materials Characterization}, volume = {182}, journal = {Materials Characterization}, issn = {1044-5803}, doi = {10.1016/j.matchar.2021.111578}, pages = {7}, abstract = {This work reports forming free/self-rectifying resistive switching characteristics and dependency of the top electrode (TE) of a crystalline HfO2-based resistive switching memory device. In the memory cells, nonlinear bipolar resistive switching characteristics, i.e., an asymmetric current-voltage curve like the Schottky diode, was observed. In addition, the device exhibits resistive switching behaviors without forming process, which makes it possible to switch the resistance state under ultra-low current levels of <10 nA. In addition, compared to the resistive switching of the proposed resistive switching memory devices with different TEs, the VSET was decreased when using TE with lower work function, and the height read margin was obtained in the sample with the Ni TE, covering over 56 × 56 arrays. Consequently, these results indicate that the interface control resistive switching properties in memory structures having the Schottky junction warrant the realization of selector-free resistive switching memory cells in a high-density crossbar array.}, language = {en} } @misc{PerezBoschQuesadaPerezMahadevaiahetal., author = {Perez-Bosch Quesada, Emilio and P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Wenger, Christian}, title = {Memristive-based in-memory computing: from device to large-scale CMOS integration}, series = {Neuromorphic Computing and Engineering}, volume = {1}, journal = {Neuromorphic Computing and Engineering}, number = {2}, issn = {2634-4386}, doi = {10.1088/2634-4386/ac2cd4}, pages = {8}, abstract = {With the rapid emergence of in-memory computing systems based on memristive technology, the integration of such memory devices in large-scale architectures is one of the main aspects to tackle. In this work we present a study of HfO2-based memristive devices for their integration in large-scale CMOS systems, namely 200 mm wafers. The DC characteristics of single metal-insulator-metal devices are analyzed taking under consideration device-to-device variabilities and switching properties. Furthermore, the distribution of the leakage current levels in the pristine state of the samples are analyzed and correlated to the amount of formingless memristors found among the measured devices. Finally, the obtained results are fitted into a physic-based compact model that enables their integration into larger-scale simulation environments.}, language = {en} } @misc{BaroniZambelliOlivoetal., author = {Baroni, Andrea and Zambelli, Cristian and Olivo, Piero and P{\´e}rez, Eduardo and Wenger, Christian and Ielmini, Daniele}, title = {Tackling the Low Conductance State Drift through Incremental Reset and Verify in RRAM Arrays}, series = {2021 IEEE International Integrated Reliability Workshop (IIRW), South Lake Tahoe, CA, USA, 10 December 2021}, journal = {2021 IEEE International Integrated Reliability Workshop (IIRW), South Lake Tahoe, CA, USA, 10 December 2021}, publisher = {Institute of Electrical and Electronics Engineers (IEEE)}, isbn = {978-1-6654-1794-5}, issn = {2374-8036}, doi = {10.1109/IIRW53245.2021.9635613}, pages = {5}, abstract = {Resistive switching memory (RRAM) is a promising technology for highly efficient computing scenarios. RRAM arrays enabled the acceleration of neural networks for artificial intelligence and the creation of In-Memory Computing circuits. However, the arrays are affected by several issues materializing in conductance variations that might cause severe performance degradation in those applications. Among those, one is related to the drift of the low conductance states appearing immediately at the end of program and verify algorithms that are fundamental for an accurate Multi-level conductance operation. In this work, we tackle the issue by developing an Incremental Reset and Verify technique showing enhanced variability and reliability features compared with a traditional refresh-based approach.}, language = {en} }