@misc{ZanottiPuglisiMiloetal., author = {Zanotti, Tommaso and Puglisi, Francesco Maria and Milo, Valerio and P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Ossorio, {\´O}scar G. and Wenger, Christian and Pavan, Paolo and Olivo, Piero and Ielmini, Daniele}, title = {Reliability of Logic-in-Memory Circuits in Resistive Memory Arrays}, series = {IEEE Transactions on Electron Devices}, volume = {67}, journal = {IEEE Transactions on Electron Devices}, number = {11}, issn = {0018-9383}, doi = {10.1109/TED.2020.3025271}, pages = {4611 -- 4615}, abstract = {Logic-in-memory (LiM) circuits based on resistive random access memory (RRAM) devices and the material implication logic are promising candidates for the development of low-power computing devices that could fulfill the growing demand of distributed computing systems. However, these circuits are affected by many reliability challenges that arise from device nonidealities (e.g., variability) and the characteristics of the employed circuit architecture. Thus, an accurate investigation of the variability at the array level is needed to evaluate the reliability and performance of such circuit architectures. In this work, we explore the reliability and performance of smart IMPLY (SIMPLY) (i.e., a recently proposed LiM architecture with improved reliability and performance) on two 4-kb RRAM arrays based on different resistive switching oxides integrated in the back end of line (BEOL) of the 0.25- μm BiCMOS process. We analyze the tradeoff between reliability and energy consumption of SIMPLY architecture by exploiting the results of an extensive array-level variability characterization of the two technologies. Finally, we study the worst case performance of a full adder implemented with the SIMPLY architecture and benchmark it on the analogous CMOS implementation.}, language = {en} } @misc{PerezOssorioDuenasetal., author = {P{\´e}rez, Eduardo and Ossorio, {\´O}scar G. and Due{\~n}as, Salvador and Cast{\´a}n, Helena and Garc{\´i}a, Hector and Wenger, Christian}, title = {Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays}, series = {Electronics (MDPI)}, volume = {9}, journal = {Electronics (MDPI)}, number = {5}, issn = {2079-9292}, doi = {10.3390/electronics9050864}, abstract = {A crucial step in order to achieve fast and low-energy switching operations in resistive random access memory (RRAM) memories is the reduction of the programming pulse width. In this study, the incremental step pulse with verify algorithm (ISPVA) was implemented by using different pulse widths between 10 μ s and 50 ns and assessed on Al-doped HfO 2 4 kbit RRAM memory arrays. The switching stability was assessed by means of an endurance test of 1k cycles. Both conductive levels and voltages needed for switching showed a remarkable good behavior along 1k reset/set cycles regardless the programming pulse width implemented. Nevertheless, the distributions of voltages as well as the amount of energy required to carry out the switching operations were definitely affected by the value of the pulse width. In addition, the data retention was evaluated after the endurance analysis by annealing the RRAM devices at 150 °C along 100 h. Just an almost negligible increase on the rate of degradation of about 1 μ A at the end of the 100 h of annealing was reported between those samples programmed by employing a pulse width of 10 μ s and those employing 50 ns. Finally, an endurance performance of 200k cycles without any degradation was achieved on 128 RRAM devices by using programming pulses of 100 ns width}, language = {en} } @misc{OssorioVinuesaGarciaetal., author = {Ossorio, {\´O}scar G. and Vinuesa, Guillermo and Garcia, Hector and Sahelices, Benjamin and Due{\~n}as, Salvador and Cast{\´a}n, Helena and P{\´e}rez, Eduardo and Mahadevaiah, Mamathamba Kalishettyhalli and Wenger, Christian}, title = {Performance Assessment of Amorphous HfO2-based RRAM Devices for Neuromorphic Applications}, series = {ECS Transactions}, volume = {102}, journal = {ECS Transactions}, number = {2}, issn = {1938-6737}, doi = {10.1149/10202.0029ecst}, pages = {29 -- 35}, abstract = {The use of thin layers of amorphous hafnium oxide has been shown to be suitable for the manufacture of Resistive Random-Access memories (RRAM). These memories are of great interest because of their simple structure and non-volatile character. They are particularly appealing as they are good candidates for substituting flash memories. In this work, the performance of the MIM structure that takes part of a 4 kbit memory array based on 1-transistor-1-resistance (1T1R) cells was studied in terms of control of intermediate states and cycle durability. DC and small signal experiments were carried out in order to fully characterize the devices, which presented excellent multilevel capabilities and resistive-switching behavior.}, language = {en} }