TY - CONF A1 - Sowinska, Małgorzata A1 - Das, Chittaranjan A1 - Wojciechowski, Konrad A1 - Snaith, Henry J. A1 - Schmeißer, Dieter T1 - XPS study of the ALD growth of Al₂O₃ on the CH₃NH₃PbI₃ T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft N2 - Organic-inorganic lead halide perovskites have emerged as very attractive absorber materials for the fabrication of low cost and high efficiency solar cells, but a delicate nature of these films is one of the main challenges for a successful commercialization. Typically, when exposed to air or moisture, perovskite films degrade within a couple of hours or days. Moreover, the methylammonium lead triiodide (CH₃NH₃PbI₃) perovskite cannot sustain a prolonged annealing at temperatures around 85∘C. In this work, we are investigating stability (upon air and thermal exposure) of a CH₃NH₃PbI₃ perovskite film coated with a thin layer of Al₂O₃ deposited by atomic layer deposition (ALD). In particular, the chemical and electronic changes occurred at the Al₂O₃/CH₃NH₃PbI₃ interface during the first 50 ALD cycles were monitored ex-situ by high-resolution and surface-sensitive synchrotron-based X-ray photoelectron spectroscopy (SR-XPS). The advantage of the ALD as a deposition method is that it can produce extremely dense layers with a very precise thickness control at room temperature. Detailed SR-XPS data analysis and a stability test of the perovskite film with alumina will be presented. KW - atomic layer deposition KW - perovskite solar cells KW - Al₂O₃ KW - X-Ray photoelectron spectroscopy KW - synchrotron Y1 - 2016 UR - https://opus4.kobv.de/opus4-UBICO/frontdoor/index/index/docId/17118 UR - http://www.dpg-verhandlungen.de/year/2016/conference/regensburg/part/cpp/session/31/contribution/6?lang=en SP - S. 206 PB - Deutsche Physikalische Gesellschaft CY - Bad Honnef ER -