TY - JOUR A1 - Beck, Romuald B. A1 - Hoffmann, Patrick A1 - Schmeißer, Dieter A1 - Bieniek, Tomasz A1 - Jakubowski, Andrzej T1 - Composition and Electrical Properties of Ultra-Thin SiOxNy Layers Formed by rf Plasma Nitrogen Implantation/Plasma Oxidation Processes Y1 - 2008 UR - https://opus4.kobv.de/opus4-UBICO/frontdoor/index/index/docId/3802 ER -