TY - CHAP A1 - Henkel, Karsten A1 - Kot, Małgorzata A1 - Richter, Matthias A1 - Tallarida, Massimo A1 - Schmeißer, Dieter A2 - Wandelt, Klaus T1 - An (In Situ)² Approach: ALD and resPES Applied to Al₂O₃, HfO₂, and TiO₂ Ultrathin Films T2 - Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry, Vol. 3.1 N2 - Oxide surface coatings are of importance in tailoring interface properties with respect to surface passivation, adjustment of surface potentials, or providing active centers for surface reactions. In this contribution, we report about surface coatings prepared by the atomic layer deposition (ALD) method. ALD is known for its conformal growth of ultrathin, dense films which exhibit a low concentration of pinholes. KW - Atomic layer deposition (ALD) KW - Resonant photoelectron spectroscopy (resPES) KW - Band scheme KW - Partial density of states (pDOS) KW - Intrinsic charges KW - Intrinsic defects KW - Aluminum oxide (Al₂O₃) KW - Hafnium oxide (HfO₂) KW - Titanium oxide(TiO₂) Y1 - 2018 UR - https://opus4.kobv.de/opus4-UBICO/frontdoor/index/index/docId/21889 SN - 978-0-12-809739-7 SN - 978-0-12-809894-3 SP - 18 EP - 26 PB - Elsevier CY - Oxford ER -