TY - GEN A1 - Schweiger, Severin A1 - Melnikov, Anton A1 - Koch, Sandro G. A1 - Schenk, Harald T1 - Two-Photon Lithography Parameter Study for Manufacturing of Acoustic Metamaterials on MEMS T2 - MikroSystemTechnik Kongress 2021 : Mikroelektronik/Mikrosystemtechnik und ihre Anwendungen Innovative Produkte für zukunftsfähige Märkte 08. – 10. November 2021, Stuttgart-Ludwigsburg N2 - Acoustic impedance matching structures can be used on capacitive micromachined ultrasonic transducers (CMUT) to increase acoustic energy transmission into the load medium. Our contribution contains a systematic study of the viability of the two-photon-polymerization lithography process for the fabrication of acoustic impedance matching metamaterials. For this purpose, acoustic simulations were conducted to find optimized dimensions of the matching structure. Based on the proposed dimensions, parameter sweeps were manufactured on substitute substrates, resulting in a viable parameter space for the direct fabrication on CMUT devices. Y1 - 2022 UR - https://opus4.kobv.de/opus4-UBICO/frontdoor/index/index/docId/28467 UR - https://www.vde-verlag.de/proceedings-de/455656092.html SN - 978-3-8007-5656-8 SP - 365 EP - 368 PB - VDE-Verlag CY - Berlin ; Offenbach ER -