Finite element analysis of EUV lithography
Author: | Jan Pomplun, Sven BurgerORCiD, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch |
---|---|
Editor: | Harald Bosse |
Document Type: | In Proceedings |
Parent Title (English): | Modeling Aspects in Optical Metrology |
Volume: | 6617 |
First Page: | 661718 |
Publisher: | Proc. SPIE |
Year of first publication: | 2007 |
DOI: | https://doi.org/10.1117/12.726156 |