Reduced basis method for source mask optimization
Author: | Jan Pomplun, Lin Zschiedrich, Sven BurgerORCiD, Frank Schmidt, Jacek Tyminski, Donis Flagello, N. Toshiharu |
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Document Type: | In Proceedings |
Parent Title (English): | Photomask Technology |
Volume: | 7823 |
First Page: | 78230E |
Publisher: | Proc. SPIE |
Year of first publication: | 2010 |
DOI: | https://doi.org/10.1117/12.866101 |