TY - CHAP A1 - Soltwisch, Victor A1 - Wernecke, Jan A1 - Haase, Anton A1 - Probst, Jürgen A1 - Schoengen, Max A1 - Scholze, Frank A1 - Pomplun, Jan A1 - Burger, Sven T1 - Determination of line profile on nanostructured surfaces using EUV and x-ray scattering T2 - Proc. SPIE Y1 - 2014 U6 - https://doi.org/10.1117/12.2066165 VL - 9235 SP - 92351D ER - TY - CHAP A1 - Burger, Sven A1 - Pomplun, Jan A1 - Schmidt, Frank ED - Bhushan, B. T1 - Finite Element Methods for Computational Nano-optics T2 - Encyclopedia of Nanotechnology Y1 - 2012 U6 - https://doi.org/10.1007/978-90-481-9751-4_17 SP - 837 EP - 843 PB - Springer Netherlands ER - TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank A1 - Tyminski, Jacek A1 - Flagello, Donis A1 - Toshiharu, N. T1 - Reduced basis method for source mask optimization T2 - Photomask Technology Y1 - 2010 U6 - https://doi.org/10.1117/12.866101 VL - 7823 SP - 78230E PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kettner, Benjamin A1 - Lockau, D. T1 - 3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films T2 - Numerical Methods in Optical Metrology Y1 - 2009 U6 - https://doi.org/10.1117/12.827543 VL - 7390 SP - 73900H PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - Finite element method for accurate 3D simulation of plasmonic waveguides T2 - Integrated Optics: Devices, Materials, and Technologies XIV Y1 - 2010 U6 - https://doi.org/10.1117/12.841995 VL - 7604 SP - 76040F PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics T2 - Integrated Photonics and Nanophotonics Research and Applications Y1 - 2008 U6 - https://doi.org/10.1364/IPNRA.2008.ITuE4 SP - ITuE4 PB - Optical Society of America ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - JOUR A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - Accelerated a posteriori error estimation for the reduced basis method with application to 3D electromagnetic scattering problems JF - SIAM J. Sci. Comput. Y1 - 2010 U6 - https://doi.org/10.1137/090760271 VL - 32 SP - 498 EP - 520 ER - TY - CHAP A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - Reduced basis method for fast and robust simulation of electromagnetic scattering problems T2 - Numerical Methods in Optical Metrology Y1 - 2009 U6 - https://doi.org/10.1117/12.827588 VL - 7390 SP - 73900I PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank T1 - Reduced basis method for computational lithography T2 - Photomask Technology Y1 - 2009 U6 - https://doi.org/10.1117/12.829639 VL - 7488 SP - 74882B PB - Proc. SPIE ER -