@inproceedings{SoltwischWerneckeHaaseetal., author = {Soltwisch, Victor and Wernecke, Jan and Haase, Anton and Probst, J{\"u}rgen and Schoengen, Max and Scholze, Frank and Pomplun, Jan and Burger, Sven}, title = {Determination of line profile on nanostructured surfaces using EUV and x-ray scattering}, series = {Proc. SPIE}, volume = {9235}, booktitle = {Proc. SPIE}, doi = {10.1117/12.2066165}, pages = {92351D}, language = {en} } @incollection{BurgerPomplunSchmidt2012, author = {Burger, Sven and Pomplun, Jan and Schmidt, Frank}, title = {Finite Element Methods for Computational Nano-optics}, series = {Encyclopedia of Nanotechnology}, booktitle = {Encyclopedia of Nanotechnology}, editor = {Bhushan, B.}, publisher = {Springer Netherlands}, doi = {10.1007/978-90-481-9751-4_17}, pages = {837 -- 843}, year = {2012}, language = {en} } @inproceedings{PomplunZschiedrichBurgeretal.2010, author = {Pomplun, Jan and Zschiedrich, Lin and Burger, Sven and Schmidt, Frank and Tyminski, Jacek and Flagello, Donis and Toshiharu, N.}, title = {Reduced basis method for source mask optimization}, series = {Photomask Technology}, volume = {7823}, booktitle = {Photomask Technology}, publisher = {Proc. SPIE}, doi = {10.1117/12.866101}, pages = {78230E}, year = {2010}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2009, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kettner, Benjamin and Lockau, D.}, title = {3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films}, series = {Numerical Methods in Optical Metrology}, volume = {7390}, booktitle = {Numerical Methods in Optical Metrology}, publisher = {Proc. SPIE}, doi = {10.1117/12.827543}, pages = {73900H}, year = {2009}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2010, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {Finite element method for accurate 3D simulation of plasmonic waveguides}, series = {Integrated Optics: Devices, Materials, and Technologies XIV}, volume = {7604}, booktitle = {Integrated Optics: Devices, Materials, and Technologies XIV}, publisher = {Proc. SPIE}, doi = {10.1117/12.841995}, pages = {76040F}, year = {2010}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2008, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics}, series = {Integrated Photonics and Nanophotonics Research and Applications}, booktitle = {Integrated Photonics and Nanophotonics Research and Applications}, publisher = {Optical Society of America}, doi = {10.1364/IPNRA.2008.ITuE4}, pages = {ITuE4}, year = {2008}, language = {en} } @inproceedings{ScholzeLaubisDerschetal.2007, author = {Scholze, Frank and Laubis, Christian and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, pages = {66171A}, year = {2007}, language = {en} } @article{PomplunSchmidt2010, author = {Pomplun, Jan and Schmidt, Frank}, title = {Accelerated a posteriori error estimation for the reduced basis method with application to 3D electromagnetic scattering problems}, series = {SIAM J. Sci. Comput.}, volume = {32}, journal = {SIAM J. Sci. Comput.}, doi = {10.1137/090760271}, pages = {498 -- 520}, year = {2010}, language = {en} } @inproceedings{PomplunSchmidt2009, author = {Pomplun, Jan and Schmidt, Frank}, title = {Reduced basis method for fast and robust simulation of electromagnetic scattering problems}, series = {Numerical Methods in Optical Metrology}, volume = {7390}, booktitle = {Numerical Methods in Optical Metrology}, publisher = {Proc. SPIE}, doi = {10.1117/12.827588}, pages = {73900I}, year = {2009}, language = {en} } @inproceedings{PomplunZschiedrichBurgeretal.2009, author = {Pomplun, Jan and Zschiedrich, Lin and Burger, Sven and Schmidt, Frank}, title = {Reduced basis method for computational lithography}, series = {Photomask Technology}, volume = {7488}, booktitle = {Photomask Technology}, publisher = {Proc. SPIE}, doi = {10.1117/12.829639}, pages = {74882B}, year = {2009}, language = {en} }