TY - CONF A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank T1 - Reduced basis method for computational lithography T2 - Photomask Technology Y1 - 2009 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/2315 VL - 7488 SP - 74882B PB - Proc. SPIE ER -